Photolithographic processing of hybrid glasses for microoptics

Ari H.O. Kärkkäinen, Juha T. Rantala, John M. Tamkin, Michael R. Descour

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11 Citations (Scopus)

Abstract

Hybrid glass materials are used in the photolithographic fabrication of optical and optomechanical structures. Two different photolithographic hybrid glass processing methods are described. The first one is referred as photolithographic patterning and the second as direct photolithographic deforming of hybrid glass materials. No etch transfer of the photoimaged structures is needed. In the latter method even the chemical development step can be excluded from the fabrication. Fabrication of lens-arrays, gratings and other binary structures is presented. The synthesized hybrid glass materials feature minimum optical transmission of 97% at wavelengths ranging from 450 nm to 1600 nm and refractive index of, e.g., 1.53 at 632.8 nm. The photolithographic patterning resulted in structure heights in excess of 180 /spl mu/m with rms surface roughness values ranging from 10 to 45 nm. The direct photolithographic deforming resulted in structure heights in excess of 27 /spl mu/m with rms surface roughness values ranging from 1 and 15 nm.
Original languageEnglish
Pages (from-to)614-623
JournalJournal of Lightwave Technology
Volume21
Issue number3
DOIs
Publication statusPublished - 2003
MoE publication typeA1 Journal article-refereed

Keywords

  • Hybrid glass materials
  • microoptics
  • photolithography
  • sol-gel

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    Kärkkäinen, A. H. O., Rantala, J. T., Tamkin, J. M., & Descour, M. R. (2003). Photolithographic processing of hybrid glasses for microoptics. Journal of Lightwave Technology, 21(3), 614-623. https://doi.org/10.1109/JLT.2003.809581