Photolithographic processing of hybrid glasses for microoptics

Ari H.O. Kärkkäinen, Juha T. Rantala, John M. Tamkin, Michael R. Descour

Research output: Contribution to journalArticleScientificpeer-review

11 Citations (Scopus)

Abstract

Hybrid glass materials are used in the photolithographic fabrication of optical and optomechanical structures. Two different photolithographic hybrid glass processing methods are described. The first one is referred as photolithographic patterning and the second as direct photolithographic deforming of hybrid glass materials. No etch transfer of the photoimaged structures is needed. In the latter method even the chemical development step can be excluded from the fabrication. Fabrication of lens-arrays, gratings and other binary structures is presented. The synthesized hybrid glass materials feature minimum optical transmission of 97% at wavelengths ranging from 450 nm to 1600 nm and refractive index of, e.g., 1.53 at 632.8 nm. The photolithographic patterning resulted in structure heights in excess of 180 /spl mu/m with rms surface roughness values ranging from 10 to 45 nm. The direct photolithographic deforming resulted in structure heights in excess of 27 /spl mu/m with rms surface roughness values ranging from 1 and 15 nm.
Original languageEnglish
Pages (from-to)614-623
Number of pages10
JournalJournal of Lightwave Technology
Volume21
Issue number3
DOIs
Publication statusPublished - 2003
MoE publication typeA1 Journal article-refereed

Fingerprint

glass
fabrication
surface roughness
lenses
gratings
refractivity
wavelengths

Keywords

  • Hybrid glass materials
  • microoptics
  • photolithography
  • sol-gel

Cite this

Kärkkäinen, A. H. O., Rantala, J. T., Tamkin, J. M., & Descour, M. R. (2003). Photolithographic processing of hybrid glasses for microoptics. Journal of Lightwave Technology, 21(3), 614-623. https://doi.org/10.1109/JLT.2003.809581
Kärkkäinen, Ari H.O. ; Rantala, Juha T. ; Tamkin, John M. ; Descour, Michael R. / Photolithographic processing of hybrid glasses for microoptics. In: Journal of Lightwave Technology. 2003 ; Vol. 21, No. 3. pp. 614-623.
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Kärkkäinen, AHO, Rantala, JT, Tamkin, JM & Descour, MR 2003, 'Photolithographic processing of hybrid glasses for microoptics', Journal of Lightwave Technology, vol. 21, no. 3, pp. 614-623. https://doi.org/10.1109/JLT.2003.809581

Photolithographic processing of hybrid glasses for microoptics. / Kärkkäinen, Ari H.O.; Rantala, Juha T.; Tamkin, John M.; Descour, Michael R.

In: Journal of Lightwave Technology, Vol. 21, No. 3, 2003, p. 614-623.

Research output: Contribution to journalArticleScientificpeer-review

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T1 - Photolithographic processing of hybrid glasses for microoptics

AU - Kärkkäinen, Ari H.O.

AU - Rantala, Juha T.

AU - Tamkin, John M.

AU - Descour, Michael R.

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AB - Hybrid glass materials are used in the photolithographic fabrication of optical and optomechanical structures. Two different photolithographic hybrid glass processing methods are described. The first one is referred as photolithographic patterning and the second as direct photolithographic deforming of hybrid glass materials. No etch transfer of the photoimaged structures is needed. In the latter method even the chemical development step can be excluded from the fabrication. Fabrication of lens-arrays, gratings and other binary structures is presented. The synthesized hybrid glass materials feature minimum optical transmission of 97% at wavelengths ranging from 450 nm to 1600 nm and refractive index of, e.g., 1.53 at 632.8 nm. The photolithographic patterning resulted in structure heights in excess of 180 /spl mu/m with rms surface roughness values ranging from 10 to 45 nm. The direct photolithographic deforming resulted in structure heights in excess of 27 /spl mu/m with rms surface roughness values ranging from 1 and 15 nm.

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KW - photolithography

KW - sol-gel

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