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PillarHall LHAR structure for Thin Film Conformality Measurements
Mikko Utriainen
,
Virpi Korpelainen
,
Oili Ylivaara
, Feng Gao
, Markku Ylilammi
, Riikka L. Puurunen
Aalto University
Research output
:
Contribution to conference
›
Conference Abstract
›
Scientific
›
peer-review
Overview
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Keyphrases
Conformality
100%
High Aspect Ratio Structure
100%
High Aspect Ratio
66%
Micro-electro-mechanical Systems
66%
Atomic Layer Deposition
66%
Ratio Test
66%
Silicon pillar
66%
Metrology
33%
Process Control
33%
Photonics
33%
Aspect Ratio
33%
Silicon Membrane
33%
Process Optimization
33%
Downscaling
33%
Conformal Deposition
33%
Visual Inspection
33%
Materials Science
33%
Measurement Method
33%
Semiconductor Devices
33%
Processing Methods
33%
Thin Film Fabrication
33%
Process Line
33%
3D Character
33%
Dimensional Accuracy
33%
Wide Temperature Range
33%
Control Monitoring
33%
CMOS Process
33%
Polysilicon
33%
All-silicon
33%
Research Partnerships
33%
Gap Size
33%
Lateral Gap
33%
Internal Length Scale
33%
Distance Indicators
33%
Standardized Measurement
33%
Membrane Roof
33%
Systems-based
33%
Increased Demand
33%
Conformal Thin Film
33%
Science Application
33%
INIS
aspect ratio
100%
thin films
100%
silicon
80%
length
60%
deposition
60%
layers
40%
applications
40%
height
40%
increasing
40%
membranes
40%
microelectromechanical systems
40%
values
20%
indicators
20%
control
20%
optimization
20%
processing
20%
demand
20%
monitoring
20%
accuracy
20%
cooperation
20%
distance
20%
metrology
20%
figure of merit
20%
temperature range
20%
semiconductor devices
20%
roofs
20%
Engineering
Conformality
100%
High Aspect Ratio
100%
Thin Films
100%
Test Structure
50%
Microelectromechanical System
50%
Atomic Layer Deposition
50%
Temperature Range
25%
Length Scale
25%
Processing Method
25%
Increasing Demand
25%
Process Lines
25%
Dimensional Accuracy
25%
Photonics
25%
Semiconductor Device
25%
Figure of Merit
25%
Aspect Ratio
25%
Polysilicon
25%
Material Science
Silicon
100%
Thin Films
100%
Microelectromechanical System
50%
Thin Film Processing Method
25%
Semiconductor Device
25%