Plasma etching microdevice fabrication

Thin film and process integration aspects: Dissertation

Sami Franssila

Research output: ThesisDissertationCollection of Articles

Original languageEnglish
QualificationDoctor Degree
Awarding Institution
  • Helsinki University of Technology
Place of PublicationHelsinki
Print ISBNs951-666-450-4
Publication statusPublished - 1995
MoE publication typeG5 Doctoral dissertation (article)

Cite this

@phdthesis{ae15938136934e7ea7095dfa118f8dee,
title = "Plasma etching microdevice fabrication: Thin film and process integration aspects: Dissertation",
author = "Sami Franssila",
note = "ELE 41 p. + app. 38 p.",
year = "1995",
language = "English",
isbn = "951-666-450-4",
series = "Acta polytechnica Scandinavica: El Electrical Engineering Series",
publisher = "Finnish Academy of Technology",
school = "Helsinki University of Technology",

}

Franssila, S 1995, 'Plasma etching microdevice fabrication: Thin film and process integration aspects: Dissertation', Doctor Degree, Helsinki University of Technology, Helsinki.

Plasma etching microdevice fabrication : Thin film and process integration aspects: Dissertation. / Franssila, Sami.

Helsinki, 1995. 79 p.

Research output: ThesisDissertationCollection of Articles

TY - THES

T1 - Plasma etching microdevice fabrication

T2 - Thin film and process integration aspects: Dissertation

AU - Franssila, Sami

N1 - ELE 41 p. + app. 38 p.

PY - 1995

Y1 - 1995

M3 - Dissertation

SN - 951-666-450-4

T3 - Acta polytechnica Scandinavica: El Electrical Engineering Series

CY - Helsinki

ER -