Plasma etching of patterned tungsten

Sami Franssila

Research output: Contribution to journalArticleScientificpeer-review


Plasma etching of tungsten is discussed from the viewpoint of thin film structure and integrated circuit process engineering. The emphasis is on patterned tungsten etching for silicon device and X-ray mask fabrication. After introducing tungsten etch chemistries and mechanisms, microstructural aspects of tungsten films (crystal structure, grain size, film density, defects, impurities) in relation to etching are discussed. Approaches to etch process optimization are presented, and the current state-of-the-art of patterned tungsten etching is reviewed.
Original languageEnglish
Pages (from-to)565-582
JournalMaterials Science Forum
Publication statusPublished - 1993
MoE publication typeA1 Journal article-refereed


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