Plasma etching of patterned tungsten

INIS

• plasma 100%
• tungsten 100%
• etching 100%
• films 33%
• density 16%
• engineering 16%
• x radiation 16%
• devices 16%
• optimization 16%
• silicon 16%
• microstructure 16%
• chemistry 16%
• impurities 16%
• thin films 16%
• crystal structure 16%
• fabrication 16%
• defects 16%
• grain size 16%
• integrated circuits 16%
• masks 16%

Keyphrases

• Tungsten 100%
• Plasma Etching 100%
• Impurities 20%
• Thin Film Structure 20%
• Grain Size 20%
• Process Optimization 20%
• Integrated Circuits 20%
• Process Engineering 20%
• Silicon Devices 20%
• Etching Process 20%
• Mask Fabrication 20%
• Tungsten Film 20%
• Film Density 20%
• X-ray Mask 20%
• Microstructural Aspects 20%
• Density Defects 20%

Material Science

• Tungsten 100%
• Plasma Etching 100%
• Film 33%
• Thin Film Structure 16%
• Defect Density 16%
• Silicon Device 16%
• Electronic Circuit 16%
• Grain Size 16%
• Crystal Structure 16%