Polymer-based optical interconnects using nanoimprint lithography

Arjen Boersma; Sjoukje Wiegersma; Bert Jan Offrein; Jeroen Duis; Jos Delis; Markus Ortsiefer; Geert van Steenberge; Mikko Karppinen; Alfons van Blaaderen; Brian Corbett

doi:10.1117/12.2001498

Polymer-based optical interconnects using nanoimprint lithography

Arjen Boersma, Sjoukje Wiegersma, Bert Jan Offrein, Jeroen Duis, Jos Delis, Markus Ortsiefer, Geert van Steenberge, Mikko Karppinen, Alfons van Blaaderen, Brian Corbett

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

7 Citations (Scopus)

Abstract

The increasing request for higher data speeds in the information and communication technology leads to continuously increasing performance of microprocessors. This has led to the introduction of optical data transmission as a replacement of electronic data transmission in most transmission applications longer than 10 meters. However, a need remains for optical data transmission for shorter distances inside the computer. This paper gives an overview of the Joint European project FIREFLY, in which new polymer based single mode waveguides are developed for integration with VCSELs, splitters and fibers that will be manufactured using multi-layer nanoimprint lithography (NIL). Innovative polymers, new applications of nano-technology, new methods for optical coupling between components, and the integration of all these new components are the technical ingredients of this ambitious project.

Original language	English
Title of host publication	Optoelectronic Interconnects XIII
Editors	Alexei L. Glebov, Ray T. Chen
Publisher	International Society for Optics and Photonics SPIE
ISBN (Print)	978-0-8194-9399-6
DOIs	https://doi.org/10.1117/12.2001498
Publication status	Published - 2013
MoE publication type	A4 Article in a conference publication
Event	SPIE Opto - San Francisco, California, United States Duration: 2 Feb 2013 → 7 Feb 2013

Publication series

Series	Proceedings of SPIE
Volume	8630
ISSN	0277-786X

Conference

Conference	SPIE Opto
Country/Territory	United States
City	San Francisco, California
Period	2/02/13 → 7/02/13

Keywords

low loss polymers
nano imprint litography
optical interconnects
photonic crystals
polymer waveguides

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10.1117/12.2001498

Cite this

Boersma, A., Wiegersma, S., Offrein, B. J., Duis, J., Delis, J., Ortsiefer, M., van Steenberge, G., Karppinen, M., van Blaaderen, A., & Corbett, B. (2013). Polymer-based optical interconnects using nanoimprint lithography. In A. L. Glebov, & R. T. Chen (Eds.), Optoelectronic Interconnects XIII [86300Y] International Society for Optics and Photonics SPIE. Proceedings of SPIE Vol. 8630 https://doi.org/10.1117/12.2001498

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title = "Polymer-based optical interconnects using nanoimprint lithography",

abstract = "The increasing request for higher data speeds in the information and communication technology leads to continuously increasing performance of microprocessors. This has led to the introduction of optical data transmission as a replacement of electronic data transmission in most transmission applications longer than 10 meters. However, a need remains for optical data transmission for shorter distances inside the computer. This paper gives an overview of the Joint European project FIREFLY, in which new polymer based single mode waveguides are developed for integration with VCSELs, splitters and fibers that will be manufactured using multi-layer nanoimprint lithography (NIL). Innovative polymers, new applications of nano-technology, new methods for optical coupling between components, and the integration of all these new components are the technical ingredients of this ambitious project.",

keywords = "low loss polymers, nano imprint litography, optical interconnects, photonic crystals, polymer waveguides",

author = "Arjen Boersma and Sjoukje Wiegersma and Offrein, {Bert Jan} and Jeroen Duis and Jos Delis and Markus Ortsiefer and {van Steenberge}, Geert and Mikko Karppinen and {van Blaaderen}, Alfons and Brian Corbett",

year = "2013",

doi = "10.1117/12.2001498",

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isbn = "978-0-8194-9399-6",

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editor = "Glebov, {Alexei L. } and Chen, {Ray T. }",

booktitle = "Optoelectronic Interconnects XIII",

address = "United States",

note = "SPIE Opto ; Conference date: 02-02-2013 Through 07-02-2013",

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Boersma, A, Wiegersma, S, Offrein, BJ, Duis, J, Delis, J, Ortsiefer, M, van Steenberge, G, Karppinen, M, van Blaaderen, A & Corbett, B 2013, Polymer-based optical interconnects using nanoimprint lithography. in AL Glebov & RT Chen (eds), Optoelectronic Interconnects XIII., 86300Y, International Society for Optics and Photonics SPIE, Proceedings of SPIE, vol. 8630, SPIE Opto, San Francisco, California, United States, 2/02/13. https://doi.org/10.1117/12.2001498

Polymer-based optical interconnects using nanoimprint lithography. / Boersma, Arjen; Wiegersma, Sjoukje; Offrein, Bert Jan et al.

Optoelectronic Interconnects XIII. ed. / Alexei L. Glebov; Ray T. Chen. International Society for Optics and Photonics SPIE, 2013. 86300Y (Proceedings of SPIE, Vol. 8630).

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

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AU - Wiegersma, Sjoukje

AU - Offrein, Bert Jan

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AU - Delis, Jos

AU - Ortsiefer, Markus

AU - van Steenberge, Geert

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AU - van Blaaderen, Alfons

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AB - The increasing request for higher data speeds in the information and communication technology leads to continuously increasing performance of microprocessors. This has led to the introduction of optical data transmission as a replacement of electronic data transmission in most transmission applications longer than 10 meters. However, a need remains for optical data transmission for shorter distances inside the computer. This paper gives an overview of the Joint European project FIREFLY, in which new polymer based single mode waveguides are developed for integration with VCSELs, splitters and fibers that will be manufactured using multi-layer nanoimprint lithography (NIL). Innovative polymers, new applications of nano-technology, new methods for optical coupling between components, and the integration of all these new components are the technical ingredients of this ambitious project.

KW - low loss polymers

KW - nano imprint litography

KW - optical interconnects

KW - photonic crystals

KW - polymer waveguides

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ER -

Polymer-based optical interconnects using nanoimprint lithography

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