Postgrowth annealing of GaInAs/GaAs and GaInAsN/GaAs quantum well samples placed in a proximity GaAs box: A simple method to improve the crystalline quality

  • Janne Pakarinen*
  • , C.S. Peng
  • , J. Puustinen
  • , Pasi Laukkanen
  • , V.-M. Korpijärvi
  • , A. Tukiainen
  • , M. Pessa
  • *Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

24 Citations (Scopus)

Abstract

The effects of thermal annealing on GaInAs/GaAs and GaInAsN/GaAs quantum wells, grown by molecular beam epitaxy, were investigated. Optical and structural properties were examined upon annealing when the samples had a 200 nm thick SiO2 cap layer, or were placed in a so-called GaAs box or were left uncapped. The GaAs box gave rise to the strongest photoluminescence without significant blueshift or structural changes at moderate annealing temperature. Capping with SiO2 impaired the samples and caused a more pronounced blueshift for the GaInAs quantum wells than for the GaInAsN ones. These results consolidate our understanding of the blueshift mechanisms.

Original languageEnglish
Article number232105
JournalApplied Physics Letters
Volume92
Issue number23
DOIs
Publication statusPublished - 2008
MoE publication typeA1 Journal article-refereed

Funding

This work was supported, in part, by the Academy of Finland within the NEONATE Project and by the Finnish Funding Agency for Technology and Innovations (TEKES). The author to whom correspondence should be addressed (J.P.) acknowledges financial support from the Graduate School of the Tampere University of Technology.

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