Properties of ALD grown Al2O3-TiO2 laminates investigated by high temperature XRD/XRR and in situ wafer curvature measurements

Mikko J. Heikkilä, Oili Ylivaara, Elisa Atosuo, Riikka L. Puurunen, Mikko Ritala, Markku Leskelä

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    Physics & Astronomy