|Number of pages||1|
|Publication status||Published - 23 Jul 2019|
|MoE publication type||Not Eligible|
|Event||19th International Conference on Atomic Layer Deposition, ALD 2019 - Bellevue, Washington, United States|
Duration: 21 Jul 2019 → 24 Jul 2019
|Conference||19th International Conference on Atomic Layer Deposition, ALD 2019|
|Period||21/07/19 → 24/07/19|
Arts, K., Utriainen, M., Puurunen, R. L., Kessels, W. M. M., & Knoops, H. C. M. (2019). Radical Surface Recombination Probabilities during Plasma ALD of SiO2, TiO2 and Al2O3 Determined from Film Conformality. 105-106. Abstract from 19th International Conference on Atomic Layer Deposition, ALD 2019, Washington, United States.