Radical Surface Recombination Probabilities during Plasma ALD of SiO2, TiO2 and Al2O3 Determined from Film Conformality

Karsten Arts, Mikko Utriainen, Riikka L. Puurunen, Wilhelmus M.M. Kessels, Harm C.M. Knoops

Research output: Contribution to conference › Conference Abstract › Scientific › peer-review

Original language	English
Pages	105-106
Number of pages	1
Publication status	Published - 23 Jul 2019
MoE publication type	Not Eligible
Event	19th International Conference on Atomic Layer Deposition, ALD 2019 - Bellevue, Washington, United States Duration: 21 Jul 2019 → 24 Jul 2019 https://ald2019.avs.org/

Conference	19th International Conference on Atomic Layer Deposition, ALD 2019
Abbreviated title	ALD2019
Country/Territory	United States
City	Washington
Period	21/07/19 → 24/07/19
Internet address	https://ald2019.avs.org/

Keywords

@conference{c8f4987156f245979466b72270f5d765,

title = "Radical Surface Recombination Probabilities during Plasma ALD of SiO2, TiO2 and Al2O3 Determined from Film Conformality",

keywords = "OtaNano",

author = "Karsten Arts and Mikko Utriainen and Puurunen, {Riikka L.} and Kessels, {Wilhelmus M.M.} and Knoops, {Harm C.M.}",

year = "2019",

month = jul,

day = "23",

language = "English",

pages = "105--106",

note = "19th International Conference on Atomic Layer Deposition, ALD 2019, ALD2019 ; Conference date: 21-07-2019 Through 24-07-2019",

url = "https://ald2019.avs.org/",

}

Radical Surface Recombination Probabilities during Plasma ALD of SiO2, TiO2 and Al2O3 Determined from Film Conformality. / Arts, Karsten; Utriainen, Mikko; Puurunen, Riikka L. et al.
2019. 105-106 Abstract from 19th International Conference on Atomic Layer Deposition, ALD 2019, Washington, Washington, United States.

Research output: Contribution to conference › Conference Abstract › Scientific › peer-review

TY - CONF

T1 - Radical Surface Recombination Probabilities during Plasma ALD of SiO2, TiO2 and Al2O3 Determined from Film Conformality

AU - Arts, Karsten

AU - Utriainen, Mikko

AU - Puurunen, Riikka L.

AU - Kessels, Wilhelmus M.M.

AU - Knoops, Harm C.M.

PY - 2019/7/23

Y1 - 2019/7/23

KW - OtaNano

UR - https://cdn.fs.pathlms.com/tciLC7LAQ9Kwtbcp2QyS

M3 - Conference Abstract

SP - 105

EP - 106

T2 - 19th International Conference on Atomic Layer Deposition, ALD 2019

Y2 - 21 July 2019 through 24 July 2019

ER -