Radical Surface Recombination Probabilities during Plasma ALD of SiO2, TiO2 and Al2O3 Determined from Film Conformality

Research output: Contribution to conference › Conference Abstract › Scientific › peer-review

Original language	English
Pages	105-106
Number of pages	1
Publication status	Published - 23 Jul 2019
MoE publication type	Not Eligible
Event	19th International Conference on Atomic Layer Deposition, ALD 2019 - Bellevue, Washington, United States Duration: 21 Jul 2019 → 24 Jul 2019 https://ald2019.avs.org/

Conference	19th International Conference on Atomic Layer Deposition, ALD 2019
Abbreviated title	ALD2019
Country/Territory	United States
City	Washington
Period	21/07/19 → 24/07/19
Internet address	https://ald2019.avs.org/

Keywords

@conference{c8f4987156f245979466b72270f5d765,

title = "Radical Surface Recombination Probabilities during Plasma ALD of SiO2, TiO2 and Al2O3 Determined from Film Conformality",

keywords = "OtaNano",

author = "Karsten Arts and Mikko Utriainen and Puurunen, \{Riikka L.\} and Kessels, \{Wilhelmus M.M.\} and Knoops, \{Harm C.M.\}",

year = "2019",

month = jul,

day = "23",

language = "English",

pages = "105--106",

note = "19th International Conference on Atomic Layer Deposition, ALD 2019, ALD2019 ; Conference date: 21-07-2019 Through 24-07-2019",

url = "https://ald2019.avs.org/",

}

Radical Surface Recombination Probabilities during Plasma ALD of SiO2, TiO2 and Al2O3 Determined from Film Conformality. / Arts, Karsten; Utriainen, Mikko; Puurunen, Riikka L. et al.
2019. 105-106 Abstract from 19th International Conference on Atomic Layer Deposition, ALD 2019, Washington, Washington, United States.

Research output: Contribution to conference › Conference Abstract › Scientific › peer-review

TY - CONF

T1 - Radical Surface Recombination Probabilities during Plasma ALD of SiO2, TiO2 and Al2O3 Determined from Film Conformality

AU - Arts, Karsten

AU - Utriainen, Mikko

AU - Puurunen, Riikka L.

AU - Kessels, Wilhelmus M.M.

AU - Knoops, Harm C.M.

PY - 2019/7/23

Y1 - 2019/7/23

KW - OtaNano

UR - https://cdn.fs.pathlms.com/tciLC7LAQ9Kwtbcp2QyS

M3 - Conference Abstract

SP - 105

EP - 106

T2 - 19th International Conference on Atomic Layer Deposition, ALD 2019

Y2 - 21 July 2019 through 24 July 2019

ER -