Radical Surface Recombination Probabilities during Plasma ALD of SiO2, TiO2 and Al2O3 Determined from Film Conformality

  • Karsten Arts
  • , Mikko Utriainen
  • , Riikka L. Puurunen
  • , Wilhelmus M.M. Kessels
  • , Harm C.M. Knoops

    Research output: Contribution to conference › Conference Abstract › Scientific › peer-review

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