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Keyphrases
Far Ultraviolet
100%
Thermal Annealing
100%
Metal Oxide Thin-film Transistors
100%
Low Temperature Process
100%
Metal Processing
100%
Annealing
60%
Indium Oxide
40%
Annealing Process
40%
Saturation Mobility
40%
Condensation Process
40%
X-ray Photoelectron Spectroscopy
20%
Low Temperature
20%
In Situ
20%
Rapid Formation
20%
In2O3 Films
20%
Enhancement-mode (E-mode)
20%
Thin-film Transistors
20%
Yield Improvement
20%
Precursor Solution
20%
Spectroscopic Measurement
20%
Printed Electronics
20%
Roll-to-roll
20%
Transistor Device
20%
Metal Oxide Semiconductor
20%
Annealing Temperature
20%
Electronics Manufacturing
20%
Upscale
20%
Production Scale
20%
Efficient Conversion
20%
Metal Structure
20%
Low Hysteresis
20%
Indium Zinc Oxide
20%
Shortest Processing Time
20%
Hydroxyl Radical Generation
20%
Metal Nitrates
20%
Ultraviolet Irradiation
20%
Oxide-oxide
20%
IZO Film
20%
INIS
oxides
100%
processing
100%
low temperature
100%
transistors
100%
metals
100%
annealing
100%
thin films
100%
far ultraviolet radiation
100%
precursor
42%
films
42%
saturation
28%
yields
28%
mobility
28%
solutions
14%
performance
14%
comparative evaluations
14%
environment
14%
production
14%
devices
14%
x-ray photoelectron spectroscopy
14%
reduction
14%
conversion
14%
oxygen
14%
irradiation
14%
hysteresis
14%
semiconductor materials
14%
fabrication
14%
zinc oxides
14%
nitrates
14%
indium
14%
indium oxides
14%
hydroxyl radicals
14%
Engineering
Low-Temperature
100%
Thin-Film Transistor
100%
Condensation Process
100%
Printed Electronics
50%
Annealing Temperature
50%
Precursor Solution
50%
Scale Production
50%
Ray Photoelectron Spectroscopy
50%
Processing Time
50%
Metal Oxide Semiconductor
50%
Material Science
Thin-Film Transistor
100%
Metal Oxide
100%
Annealing
100%
Film
100%
Indium
66%
Zinc Oxide
33%
Photoemission Spectroscopy
33%
Oxide Semiconductor
33%
Oxide Compound
33%
Chemical Engineering
Film
100%
Indium
40%
Oxide Semiconductors
20%
Zinc Oxide
20%
Hydroxyl Radical Generation
20%