Rapid thermal annealing of SI1-x GEx layers formed by germanium ion implantation

Zheng Xia (Corresponding Author), Jaakko Saarilahti, Hannu Ronkainen, Simo Eränen, Ilkka Suni, Jyrki Molarius, Pekka Kuivalainen, Eero Ristolainen, T Tuomi

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    6 Citations (Scopus)


    (100) Si samples, amorphized by implanting with 50, 70 and 100 keV 74Ge+ ions at doses of the order of 1 × 1016cm−2, have been recrystallized by rapid thermal annealing (RTA) with different temperature-time (T−t) combinations. Monte Carlo calculations using TRIM-91 computer program were performed to estimate the depth of amorphized regions, implanted Ge distributions and recoil-implanted O depth profiles. The RBS channeling measurements show that fully epitaxial regrowth of implanted layers can be reached with proper rapid thermal processing. An empirical guide is presented for regrowing the implanted SiGe layers with RTA. The recoil-implanted oxygen in the implanted layers was measured by 16 O(α,α)16 RBS resonance channeling and SIMS.
    Original languageEnglish
    Pages (from-to)247-254
    Number of pages8
    JournalNuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms
    Issue number3
    Publication statusPublished - 3 May 1994
    MoE publication typeA1 Journal article-refereed


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