Reactively co-sputtered in situ annealed superconducting Y1Ba2Cu3O7-x thin films

Jorma Salmi, Jaakko Saarilahti, Ilkka Suni

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    Abstract

    Thin films of Y1Ba2Cu3O7-x have been deposited using reactive co-sputtering from Y, BaCu and Cu targets and combined with in situ postannealing. Zero resistance temperatures of 89 K on cubic yttrium stabilized zirconia substrates and 82 K on sapphire substrates with ZrO2 buffer layer have been achieved. Effects of deposition and postannealing parameters on thin film stoichiometry, morphology and superconducting properties are discussed.
    Original languageEnglish
    Title of host publicationHigh Tc Superconductor Thin Films
    Subtitle of host publicationProceedings of Symposium A1 on High Temperature Superconductor Thin Films
    EditorsL. Correra
    PublisherNorth-Holland Publ Co
    Pages529-533
    ISBN (Print)978-0-444-89353-6
    DOIs
    Publication statusPublished - 1992
    MoE publication typeA4 Article in a conference publication
    EventInternational Conference on Advanced Materials, ICAM '91 - Strasbourg, France
    Duration: 27 May 199131 May 1991

    Conference

    ConferenceInternational Conference on Advanced Materials, ICAM '91
    CountryFrance
    CityStrasbourg
    Period27/05/9131/05/91

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  • Cite this

    Salmi, J., Saarilahti, J., & Suni, I. (1992). Reactively co-sputtered in situ annealed superconducting Y1Ba2Cu3O7-x thin films. In L. Correra (Ed.), High Tc Superconductor Thin Films: Proceedings of Symposium A1 on High Temperature Superconductor Thin Films (pp. 529-533). North-Holland Publ Co. https://doi.org/10.1016/B978-0-444-89353-6.50086-5