Keyphrases
Capacitors
100%
Tantalum Pentafluoride
100%
Integrated Capacitor
100%
Small Capacitor
50%
Capacitance
25%
Surface Roughness
25%
Electrical Properties
25%
Dielectric
25%
Flow Ratio
25%
Oxide Film
25%
X Ray Diffraction
25%
Deposition Process
25%
Gas Flow
25%
Glass Wafer
25%
Capacitance Density
25%
Relative Permittivity
25%
High Dielectric Constant
25%
Ta2O5
25%
Orthorhombic
25%
Sputtering Gas
25%
Copper Electrode
25%
Quality Factor (Q-factor)
25%
Backscattering Spectroscopy
25%
Low-frequency Measurement
25%
Radio Frequency Magnetron Sputtering
25%
Cluster Tools
25%
Ar Flow
25%
Thick Oxide
25%
INIS
thin films
100%
capacitors
100%
tantalum oxides
100%
capacitance
25%
films
25%
oxygen
25%
sputtering
25%
ghz range
25%
values
12%
tools
12%
density
12%
surfaces
12%
roughness
12%
oxides
12%
size
12%
radiowave radiation
12%
electrical properties
12%
deposition
12%
copper
12%
magnetrons
12%
spectroscopy
12%
helium 4
12%
electrodes
12%
dielectrics
12%
x-ray diffraction
12%
glass
12%
stoichiometry
12%
gas flow
12%
MeV range
12%
khz range
12%
frequency measurement
12%
orthorhombic lattices
12%
dielectric constant
12%
backscattering
12%
permittivity
12%
quality factor
12%
frequency dependence
12%
q-value
12%
Engineering
Thin Films
100%
Oxide Film
50%
High Dielectric Constant
50%
Ray Diffraction
50%
Gas Flow
50%
Dielectrics
50%
Magnetron
50%
Radio Frequency
50%
Deposition Process
50%
Q Factor
50%
Relative Permittivity
50%
Chemistry
Tantalum
100%
Dielectric Constant
66%
X-Ray Diffraction
33%
Deposition Process
33%
Electrical Property
33%
Dielectric Material
33%
Backscattering
33%
Magnetron Sputtering
33%
electrode
33%
Surface Roughness
33%
Flow
33%
Material Science
Capacitor
100%
Tantalum
100%
Thin Films
100%
Permittivity
25%
Capacitance
25%
Surface Roughness
12%
Magnetron Sputtering
12%
Film
12%
Density
12%
X-Ray Diffraction
12%
Gas Flow
12%
Oxide Film
12%
Dielectric Material
12%
Chemical Engineering
Film
100%
Magnetron Sputtering
25%