Recent developments in homogeneous advanced oxidation processes for water and wastewater treatment

M. Muruganandham, R. P.S. Suri, Sh Jafari, M. Sillanpää, Gang Juan Lee, J. J. Wu, M. Swaminathan

Research output: Contribution to journalReview ArticleScientificpeer-review

36 Citations (Scopus)

Abstract

This paper reports on recent developments in homogeneous Advanced Oxidation Processes (AOPs) for the treatment of water and wastewater. It has already been established that AOPs are very efficient compared to conventional treatment methods for degradation and mineralization of recalcitrant pollutants present in water and wastewater. AOPs generate a powerful oxidizing agent, hydroxyl radical, which can react with most of the pollutants present in wastewater. Therefore, it is important to discuss recent developments in AOPs. The homogeneous AOPs such as O3, UV/O3, UV/O 3/H2O2, and UV/H2O2, Fe2+/H2O2, UV/Fe2+/H 2O2 on the degradation of pollutants are discussed in this paper. The influence on the process efficiency of various experimental parameters such as solution pH, temperature, oxidant concentration, and the dosage of the light source is discussed. A list of contaminants used for degradation by various AOPs and the experimental conditions used for the treatment are discussed in detail.

Original languageEnglish
Article number821674
JournalInternational Journal of Photoenergy
Volume2014
DOIs
Publication statusPublished - 1 Jan 2014
MoE publication typeA2 Review article in a scientific journal

Fingerprint

water treatment
Water treatment
Wastewater treatment
Oxidation
oxidation
contaminants
Wastewater
degradation
Oxidants
Degradation
Water
hydroxyl radicals
Hydroxyl Radical
lists
water
Light sources
light sources
Impurities
dosage

Cite this

Muruganandham, M., Suri, R. P. S., Jafari, S., Sillanpää, M., Lee, G. J., Wu, J. J., & Swaminathan, M. (2014). Recent developments in homogeneous advanced oxidation processes for water and wastewater treatment. International Journal of Photoenergy, 2014, [821674]. https://doi.org/10.1155/2014/821674
Muruganandham, M. ; Suri, R. P.S. ; Jafari, Sh ; Sillanpää, M. ; Lee, Gang Juan ; Wu, J. J. ; Swaminathan, M. / Recent developments in homogeneous advanced oxidation processes for water and wastewater treatment. In: International Journal of Photoenergy. 2014 ; Vol. 2014.
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Muruganandham, M, Suri, RPS, Jafari, S, Sillanpää, M, Lee, GJ, Wu, JJ & Swaminathan, M 2014, 'Recent developments in homogeneous advanced oxidation processes for water and wastewater treatment', International Journal of Photoenergy, vol. 2014, 821674. https://doi.org/10.1155/2014/821674

Recent developments in homogeneous advanced oxidation processes for water and wastewater treatment. / Muruganandham, M.; Suri, R. P.S.; Jafari, Sh; Sillanpää, M.; Lee, Gang Juan; Wu, J. J.; Swaminathan, M.

In: International Journal of Photoenergy, Vol. 2014, 821674, 01.01.2014.

Research output: Contribution to journalReview ArticleScientificpeer-review

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