Review Article: Recommended reading list of early publications on atomic layer deposition: Outcome of the "Virtual Project on the History of ALD"

TY - JOUR

T1 - Review Article: Recommended reading list of early publications on atomic layer deposition

T2 - Outcome of the "Virtual Project on the History of ALD"

AU - Ahvenniemi, Esko

AU - Akbashev, Andrew

AU - Ali, Saima

AU - Bechelany, Mikhael

AU - Berdova, Maria

AU - Boyadjiev, Stefan

AU - Cameron, David

AU - Chen, Rong

AU - Chubarov, Mikhail

AU - Cremers, Veronique

AU - Devi, Anjana

AU - Drozd, Viktor

AU - Elnikova, Liliya

AU - Gottardi, Gloria

AU - Grigoras, Kestutis

AU - Hausmann, Dennis

AU - Hwang, Cheol Seong

AU - Jen, Shih-Hui

AU - Kallio, Tanja

AU - Kanervo, Jaana

AU - Khmelnitskiy, Ivan

AU - Kim, Do Han

AU - Klibanov, Lev

AU - Koshtyal, Yury

AU - Krause, Outi

AU - Kuhs, Jakob

AU - Kärkkänen, Irina

AU - Kääriäinen, Marja-Leena

AU - Kääriäinen, Tommi

AU - Lamagna, Luca

AU - Lapicki, Adam

AU - Leskelä, Markku

AU - Lipsanen, Harri

AU - Lyytinen, Jussi

AU - Malkov, Anatoly

AU - Malygin, Anatoly

AU - Mennad, Abdelkader

AU - Militzer, Christian

AU - Molarius, Jyrki

AU - Norek, Małgorzata

AU - Özgit-Akgün, Çağla

AU - Panov, Mikhail

AU - Pedersen, Henrik

AU - Piallat, Fabien

AU - Popov, Georgi

AU - Puurunen, Riikka

AU - Rampelberg, Geert

AU - Ras, Robin H.A.

AU - Rauwel, Erwan

AU - Roozeboom, Fred

AU - Sajavaara, Timo

AU - Salami, Hossein

AU - Savin, Hele

AU - Schneider, Nathanaelle

AU - Seidel, Thomas E.

AU - Sundqvist, Jonas

AU - Suyatin, Dmitry

AU - Törndahl, Tobias

AU - van Ommen, J. Ruud

AU - Wiemer, Claudia

AU - Ylivaara, Oili

AU - Yurkevich, Oksana

N1 - CA2: BA1401 CA2: BA1403 Project code: 102086 PGN: 13 AU2: Grigoras, Kestutis AU2: Puurunen, Riikka AU2: Ylivaara, Oili

PY - 2017/1/1

Y1 - 2017/1/1

N2 - Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name "molecular layering" (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency.

AB - Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name "molecular layering" (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency.

KW - Atomic layer

KW - deposition

KW - Epitaxy

KW - Thin films

KW - Patents

KW - Silica

UR - http://www.scopus.com/inward/record.url?scp=85007005785&partnerID=8YFLogxK

U2 - 10.1116/1.4971389

DO - 10.1116/1.4971389

M3 - Review Article

VL - 35

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

SN - 0734-2101

IS - 1

M1 - 010801

ER -