Review Article: Recommended reading list of early publications on atomic layer deposition

Outcome of the "Virtual Project on the History of ALD"

Esko Ahvenniemi, Andrew Akbashev, Saima Ali, Mikhael Bechelany, Maria Berdova, Stefan Boyadjiev, David Cameron, Rong Chen, Mikhail Chubarov, Veronique Cremers, Anjana Devi, Viktor Drozd, Liliya Elnikova, Gloria Gottardi, Kestutis Grigoras, Dennis Hausmann, Cheol Seong Hwang, Shih-Hui Jen, Tanja Kallio, Jaana Kanervo & 42 others Ivan Khmelnitskiy, Do Han Kim, Lev Klibanov, Yury Koshtyal, Outi Krause, Jakob Kuhs, Irina Kärkkänen, Marja-Leena Kääriäinen, Tommi Kääriäinen, Luca Lamagna, Adam Lapicki, Markku Leskelä, Harri Lipsanen, Jussi Lyytinen, Anatoly Malkov, Anatoly Malygin, Abdelkader Mennad, Christian Militzer, Jyrki Molarius, Małgorzata Norek, Çağla Özgit-Akgün, Mikhail Panov, Henrik Pedersen, Fabien Piallat, Georgi Popov, Riikka Puurunen, Geert Rampelberg, Robin H.A. Ras, Erwan Rauwel, Fred Roozeboom, Timo Sajavaara, Hossein Salami, Hele Savin, Nathanaelle Schneider, Thomas E. Seidel, Jonas Sundqvist, Dmitry Suyatin, Tobias Törndahl, J. Ruud van Ommen, Claudia Wiemer, Oili Ylivaara, Oksana Yurkevich

Research output: Contribution to journalReview ArticleScientificpeer-review

27 Citations (Scopus)

Abstract

Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name "molecular layering" (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency.
Original languageEnglish
Article number 010801
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume35
Issue number1
DOIs
Publication statusPublished - 1 Jan 2017
MoE publication typeA2 Review article in a scientific journal

Fingerprint

Atomic layer deposition
atomic layer epitaxy
lists
histories
Atomic layer epitaxy
Finland
U.S.S.R.
Gases
voting
Ireland
United Kingdom
inorganic materials
patents
dating
stopping
Semiconductor materials
Japan
manufacturing
Thin films
vapor phases

Keywords

  • Atomic layer
  • deposition
  • Epitaxy
  • Thin films
  • Patents
  • Silica

Cite this

Ahvenniemi, Esko ; Akbashev, Andrew ; Ali, Saima ; Bechelany, Mikhael ; Berdova, Maria ; Boyadjiev, Stefan ; Cameron, David ; Chen, Rong ; Chubarov, Mikhail ; Cremers, Veronique ; Devi, Anjana ; Drozd, Viktor ; Elnikova, Liliya ; Gottardi, Gloria ; Grigoras, Kestutis ; Hausmann, Dennis ; Hwang, Cheol Seong ; Jen, Shih-Hui ; Kallio, Tanja ; Kanervo, Jaana ; Khmelnitskiy, Ivan ; Kim, Do Han ; Klibanov, Lev ; Koshtyal, Yury ; Krause, Outi ; Kuhs, Jakob ; Kärkkänen, Irina ; Kääriäinen, Marja-Leena ; Kääriäinen, Tommi ; Lamagna, Luca ; Lapicki, Adam ; Leskelä, Markku ; Lipsanen, Harri ; Lyytinen, Jussi ; Malkov, Anatoly ; Malygin, Anatoly ; Mennad, Abdelkader ; Militzer, Christian ; Molarius, Jyrki ; Norek, Małgorzata ; Özgit-Akgün, Çağla ; Panov, Mikhail ; Pedersen, Henrik ; Piallat, Fabien ; Popov, Georgi ; Puurunen, Riikka ; Rampelberg, Geert ; Ras, Robin H.A. ; Rauwel, Erwan ; Roozeboom, Fred ; Sajavaara, Timo ; Salami, Hossein ; Savin, Hele ; Schneider, Nathanaelle ; Seidel, Thomas E. ; Sundqvist, Jonas ; Suyatin, Dmitry ; Törndahl, Tobias ; van Ommen, J. Ruud ; Wiemer, Claudia ; Ylivaara, Oili ; Yurkevich, Oksana. / Review Article: Recommended reading list of early publications on atomic layer deposition : Outcome of the "Virtual Project on the History of ALD". In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2017 ; Vol. 35, No. 1.
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abstract = "Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name {"}molecular layering{"} (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency.",
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Ahvenniemi, E, Akbashev, A, Ali, S, Bechelany, M, Berdova, M, Boyadjiev, S, Cameron, D, Chen, R, Chubarov, M, Cremers, V, Devi, A, Drozd, V, Elnikova, L, Gottardi, G, Grigoras, K, Hausmann, D, Hwang, CS, Jen, S-H, Kallio, T, Kanervo, J, Khmelnitskiy, I, Kim, DH, Klibanov, L, Koshtyal, Y, Krause, O, Kuhs, J, Kärkkänen, I, Kääriäinen, M-L, Kääriäinen, T, Lamagna, L, Lapicki, A, Leskelä, M, Lipsanen, H, Lyytinen, J, Malkov, A, Malygin, A, Mennad, A, Militzer, C, Molarius, J, Norek, M, Özgit-Akgün, Ç, Panov, M, Pedersen, H, Piallat, F, Popov, G, Puurunen, R, Rampelberg, G, Ras, RHA, Rauwel, E, Roozeboom, F, Sajavaara, T, Salami, H, Savin, H, Schneider, N, Seidel, TE, Sundqvist, J, Suyatin, D, Törndahl, T, van Ommen, JR, Wiemer, C, Ylivaara, O & Yurkevich, O 2017, 'Review Article: Recommended reading list of early publications on atomic layer deposition: Outcome of the "Virtual Project on the History of ALD"', Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, vol. 35, no. 1, 010801. https://doi.org/10.1116/1.4971389

Review Article: Recommended reading list of early publications on atomic layer deposition : Outcome of the "Virtual Project on the History of ALD". / Ahvenniemi, Esko; Akbashev, Andrew; Ali, Saima; Bechelany, Mikhael; Berdova, Maria; Boyadjiev, Stefan; Cameron, David; Chen, Rong; Chubarov, Mikhail; Cremers, Veronique; Devi, Anjana; Drozd, Viktor; Elnikova, Liliya ; Gottardi, Gloria; Grigoras, Kestutis; Hausmann, Dennis; Hwang, Cheol Seong; Jen, Shih-Hui; Kallio, Tanja; Kanervo, Jaana; Khmelnitskiy, Ivan; Kim, Do Han; Klibanov, Lev; Koshtyal, Yury; Krause, Outi; Kuhs, Jakob; Kärkkänen, Irina ; Kääriäinen, Marja-Leena; Kääriäinen, Tommi; Lamagna, Luca; Lapicki, Adam; Leskelä, Markku; Lipsanen, Harri; Lyytinen, Jussi; Malkov, Anatoly; Malygin, Anatoly; Mennad, Abdelkader; Militzer, Christian ; Molarius, Jyrki; Norek, Małgorzata; Özgit-Akgün, Çağla; Panov, Mikhail; Pedersen, Henrik; Piallat, Fabien; Popov, Georgi; Puurunen, Riikka; Rampelberg, Geert; Ras, Robin H.A.; Rauwel, Erwan; Roozeboom, Fred; Sajavaara, Timo; Salami, Hossein; Savin, Hele; Schneider, Nathanaelle; Seidel, Thomas E.; Sundqvist, Jonas; Suyatin, Dmitry; Törndahl, Tobias; van Ommen, J. Ruud; Wiemer, Claudia; Ylivaara, Oili; Yurkevich, Oksana.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 35, No. 1, 010801, 01.01.2017.

Research output: Contribution to journalReview ArticleScientificpeer-review

TY - JOUR

T1 - Review Article: Recommended reading list of early publications on atomic layer deposition

T2 - Outcome of the "Virtual Project on the History of ALD"

AU - Ahvenniemi, Esko

AU - Akbashev, Andrew

AU - Ali, Saima

AU - Bechelany, Mikhael

AU - Berdova, Maria

AU - Boyadjiev, Stefan

AU - Cameron, David

AU - Chen, Rong

AU - Chubarov, Mikhail

AU - Cremers, Veronique

AU - Devi, Anjana

AU - Drozd, Viktor

AU - Elnikova, Liliya

AU - Gottardi, Gloria

AU - Grigoras, Kestutis

AU - Hausmann, Dennis

AU - Hwang, Cheol Seong

AU - Jen, Shih-Hui

AU - Kallio, Tanja

AU - Kanervo, Jaana

AU - Khmelnitskiy, Ivan

AU - Kim, Do Han

AU - Klibanov, Lev

AU - Koshtyal, Yury

AU - Krause, Outi

AU - Kuhs, Jakob

AU - Kärkkänen, Irina

AU - Kääriäinen, Marja-Leena

AU - Kääriäinen, Tommi

AU - Lamagna, Luca

AU - Lapicki, Adam

AU - Leskelä, Markku

AU - Lipsanen, Harri

AU - Lyytinen, Jussi

AU - Malkov, Anatoly

AU - Malygin, Anatoly

AU - Mennad, Abdelkader

AU - Militzer, Christian

AU - Molarius, Jyrki

AU - Norek, Małgorzata

AU - Özgit-Akgün, Çağla

AU - Panov, Mikhail

AU - Pedersen, Henrik

AU - Piallat, Fabien

AU - Popov, Georgi

AU - Puurunen, Riikka

AU - Rampelberg, Geert

AU - Ras, Robin H.A.

AU - Rauwel, Erwan

AU - Roozeboom, Fred

AU - Sajavaara, Timo

AU - Salami, Hossein

AU - Savin, Hele

AU - Schneider, Nathanaelle

AU - Seidel, Thomas E.

AU - Sundqvist, Jonas

AU - Suyatin, Dmitry

AU - Törndahl, Tobias

AU - van Ommen, J. Ruud

AU - Wiemer, Claudia

AU - Ylivaara, Oili

AU - Yurkevich, Oksana

N1 - CA2: BA1401 CA2: BA1403 Project code: 102086 PGN: 13 AU2: Grigoras, Kestutis AU2: Puurunen, Riikka AU2: Ylivaara, Oili

PY - 2017/1/1

Y1 - 2017/1/1

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AB - Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name "molecular layering" (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency.

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KW - Epitaxy

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KW - Patents

KW - Silica

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