Review Article: Recommended reading list of early publications on atomic layer deposition: Outcome of the "Virtual Project on the History of ALD"

Esko Ahvenniemi, Andrew Akbashev, Saima Ali, Mikhael Bechelany, Maria Berdova, Stefan Boyadjiev, David Cameron, Rong Chen, Mikhail Chubarov, Veronique Cremers, Anjana Devi, Viktor Drozd, Liliya Elnikova, Gloria Gottardi, Kestutis Grigoras, Dennis Hausmann, Cheol Seong Hwang, Shih-Hui Jen, Tanja Kallio, Jaana KanervoIvan Khmelnitskiy, Do Han Kim, Lev Klibanov, Yury Koshtyal, Outi Krause, Jakob Kuhs, Irina Kärkkänen, Marja-Leena Kääriäinen, Tommi Kääriäinen, Luca Lamagna, Adam Lapicki, Markku Leskelä, Harri Lipsanen, Jussi Lyytinen, Anatoly Malkov, Anatoly Malygin, Abdelkader Mennad, Christian Militzer, Jyrki Molarius, Małgorzata Norek, Çağla Özgit-Akgün, Mikhail Panov, Henrik Pedersen, Fabien Piallat, Georgi Popov, Riikka Puurunen, Geert Rampelberg, Robin H.A. Ras, Erwan Rauwel, Fred Roozeboom, Timo Sajavaara, Hossein Salami, Hele Savin, Nathanaelle Schneider, Thomas E. Seidel, Jonas Sundqvist, Dmitry Suyatin, Tobias Törndahl, J. Ruud van Ommen, Claudia Wiemer, Oili Ylivaara, Oksana Yurkevich

    Research output: Contribution to journalReview ArticleScientificpeer-review

    28 Citations (Scopus)

    Abstract

    Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name "molecular layering" (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency.
    Original languageEnglish
    Article number 010801
    JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
    Volume35
    Issue number1
    DOIs
    Publication statusPublished - 1 Jan 2017
    MoE publication typeA2 Review article in a scientific journal

    Fingerprint

    Atomic layer deposition
    atomic layer epitaxy
    lists
    histories
    Atomic layer epitaxy
    Finland
    U.S.S.R.
    Gases
    voting
    Ireland
    United Kingdom
    inorganic materials
    patents
    dating
    stopping
    Semiconductor materials
    Japan
    manufacturing
    Thin films
    vapor phases

    Keywords

    • Atomic layer
    • deposition
    • Epitaxy
    • Thin films
    • Patents
    • Silica

    Cite this

    Ahvenniemi, Esko ; Akbashev, Andrew ; Ali, Saima ; Bechelany, Mikhael ; Berdova, Maria ; Boyadjiev, Stefan ; Cameron, David ; Chen, Rong ; Chubarov, Mikhail ; Cremers, Veronique ; Devi, Anjana ; Drozd, Viktor ; Elnikova, Liliya ; Gottardi, Gloria ; Grigoras, Kestutis ; Hausmann, Dennis ; Hwang, Cheol Seong ; Jen, Shih-Hui ; Kallio, Tanja ; Kanervo, Jaana ; Khmelnitskiy, Ivan ; Kim, Do Han ; Klibanov, Lev ; Koshtyal, Yury ; Krause, Outi ; Kuhs, Jakob ; Kärkkänen, Irina ; Kääriäinen, Marja-Leena ; Kääriäinen, Tommi ; Lamagna, Luca ; Lapicki, Adam ; Leskelä, Markku ; Lipsanen, Harri ; Lyytinen, Jussi ; Malkov, Anatoly ; Malygin, Anatoly ; Mennad, Abdelkader ; Militzer, Christian ; Molarius, Jyrki ; Norek, Małgorzata ; Özgit-Akgün, Çağla ; Panov, Mikhail ; Pedersen, Henrik ; Piallat, Fabien ; Popov, Georgi ; Puurunen, Riikka ; Rampelberg, Geert ; Ras, Robin H.A. ; Rauwel, Erwan ; Roozeboom, Fred ; Sajavaara, Timo ; Salami, Hossein ; Savin, Hele ; Schneider, Nathanaelle ; Seidel, Thomas E. ; Sundqvist, Jonas ; Suyatin, Dmitry ; Törndahl, Tobias ; van Ommen, J. Ruud ; Wiemer, Claudia ; Ylivaara, Oili ; Yurkevich, Oksana. / Review Article: Recommended reading list of early publications on atomic layer deposition : Outcome of the "Virtual Project on the History of ALD". In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2017 ; Vol. 35, No. 1.
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    abstract = "Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name {"}molecular layering{"} (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency.",
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    author = "Esko Ahvenniemi and Andrew Akbashev and Saima Ali and Mikhael Bechelany and Maria Berdova and Stefan Boyadjiev and David Cameron and Rong Chen and Mikhail Chubarov and Veronique Cremers and Anjana Devi and Viktor Drozd and Liliya Elnikova and Gloria Gottardi and Kestutis Grigoras and Dennis Hausmann and Hwang, {Cheol Seong} and Shih-Hui Jen and Tanja Kallio and Jaana Kanervo and Ivan Khmelnitskiy and Kim, {Do Han} and Lev Klibanov and Yury Koshtyal and Outi Krause and Jakob Kuhs and Irina K{\"a}rkk{\"a}nen and Marja-Leena K{\"a}{\"a}ri{\"a}inen and Tommi K{\"a}{\"a}ri{\"a}inen and Luca Lamagna and Adam Lapicki and Markku Leskel{\"a} and Harri Lipsanen and Jussi Lyytinen and Anatoly Malkov and Anatoly Malygin and Abdelkader Mennad and Christian Militzer and Jyrki Molarius and Małgorzata Norek and {\cC}ağla {\"O}zgit-Akg{\"u}n and Mikhail Panov and Henrik Pedersen and Fabien Piallat and Georgi Popov and Riikka Puurunen and Geert Rampelberg and Ras, {Robin H.A.} and Erwan Rauwel and Fred Roozeboom and Timo Sajavaara and Hossein Salami and Hele Savin and Nathanaelle Schneider and Seidel, {Thomas E.} and Jonas Sundqvist and Dmitry Suyatin and Tobias T{\"o}rndahl and {van Ommen}, {J. Ruud} and Claudia Wiemer and Oili Ylivaara and Oksana Yurkevich",
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    Ahvenniemi, E, Akbashev, A, Ali, S, Bechelany, M, Berdova, M, Boyadjiev, S, Cameron, D, Chen, R, Chubarov, M, Cremers, V, Devi, A, Drozd, V, Elnikova, L, Gottardi, G, Grigoras, K, Hausmann, D, Hwang, CS, Jen, S-H, Kallio, T, Kanervo, J, Khmelnitskiy, I, Kim, DH, Klibanov, L, Koshtyal, Y, Krause, O, Kuhs, J, Kärkkänen, I, Kääriäinen, M-L, Kääriäinen, T, Lamagna, L, Lapicki, A, Leskelä, M, Lipsanen, H, Lyytinen, J, Malkov, A, Malygin, A, Mennad, A, Militzer, C, Molarius, J, Norek, M, Özgit-Akgün, Ç, Panov, M, Pedersen, H, Piallat, F, Popov, G, Puurunen, R, Rampelberg, G, Ras, RHA, Rauwel, E, Roozeboom, F, Sajavaara, T, Salami, H, Savin, H, Schneider, N, Seidel, TE, Sundqvist, J, Suyatin, D, Törndahl, T, van Ommen, JR, Wiemer, C, Ylivaara, O & Yurkevich, O 2017, 'Review Article: Recommended reading list of early publications on atomic layer deposition: Outcome of the "Virtual Project on the History of ALD"', Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, vol. 35, no. 1, 010801. https://doi.org/10.1116/1.4971389

    Review Article: Recommended reading list of early publications on atomic layer deposition : Outcome of the "Virtual Project on the History of ALD". / Ahvenniemi, Esko; Akbashev, Andrew; Ali, Saima; Bechelany, Mikhael; Berdova, Maria; Boyadjiev, Stefan; Cameron, David; Chen, Rong; Chubarov, Mikhail; Cremers, Veronique; Devi, Anjana; Drozd, Viktor; Elnikova, Liliya ; Gottardi, Gloria; Grigoras, Kestutis; Hausmann, Dennis; Hwang, Cheol Seong; Jen, Shih-Hui; Kallio, Tanja; Kanervo, Jaana; Khmelnitskiy, Ivan; Kim, Do Han; Klibanov, Lev; Koshtyal, Yury; Krause, Outi; Kuhs, Jakob; Kärkkänen, Irina ; Kääriäinen, Marja-Leena; Kääriäinen, Tommi; Lamagna, Luca; Lapicki, Adam; Leskelä, Markku; Lipsanen, Harri; Lyytinen, Jussi; Malkov, Anatoly; Malygin, Anatoly; Mennad, Abdelkader; Militzer, Christian ; Molarius, Jyrki; Norek, Małgorzata; Özgit-Akgün, Çağla; Panov, Mikhail; Pedersen, Henrik; Piallat, Fabien; Popov, Georgi; Puurunen, Riikka; Rampelberg, Geert; Ras, Robin H.A.; Rauwel, Erwan; Roozeboom, Fred; Sajavaara, Timo; Salami, Hossein; Savin, Hele; Schneider, Nathanaelle; Seidel, Thomas E.; Sundqvist, Jonas; Suyatin, Dmitry; Törndahl, Tobias; van Ommen, J. Ruud; Wiemer, Claudia; Ylivaara, Oili; Yurkevich, Oksana.

    In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 35, No. 1, 010801, 01.01.2017.

    Research output: Contribution to journalReview ArticleScientificpeer-review

    TY - JOUR

    T1 - Review Article: Recommended reading list of early publications on atomic layer deposition

    T2 - Outcome of the "Virtual Project on the History of ALD"

    AU - Ahvenniemi, Esko

    AU - Akbashev, Andrew

    AU - Ali, Saima

    AU - Bechelany, Mikhael

    AU - Berdova, Maria

    AU - Boyadjiev, Stefan

    AU - Cameron, David

    AU - Chen, Rong

    AU - Chubarov, Mikhail

    AU - Cremers, Veronique

    AU - Devi, Anjana

    AU - Drozd, Viktor

    AU - Elnikova, Liliya

    AU - Gottardi, Gloria

    AU - Grigoras, Kestutis

    AU - Hausmann, Dennis

    AU - Hwang, Cheol Seong

    AU - Jen, Shih-Hui

    AU - Kallio, Tanja

    AU - Kanervo, Jaana

    AU - Khmelnitskiy, Ivan

    AU - Kim, Do Han

    AU - Klibanov, Lev

    AU - Koshtyal, Yury

    AU - Krause, Outi

    AU - Kuhs, Jakob

    AU - Kärkkänen, Irina

    AU - Kääriäinen, Marja-Leena

    AU - Kääriäinen, Tommi

    AU - Lamagna, Luca

    AU - Lapicki, Adam

    AU - Leskelä, Markku

    AU - Lipsanen, Harri

    AU - Lyytinen, Jussi

    AU - Malkov, Anatoly

    AU - Malygin, Anatoly

    AU - Mennad, Abdelkader

    AU - Militzer, Christian

    AU - Molarius, Jyrki

    AU - Norek, Małgorzata

    AU - Özgit-Akgün, Çağla

    AU - Panov, Mikhail

    AU - Pedersen, Henrik

    AU - Piallat, Fabien

    AU - Popov, Georgi

    AU - Puurunen, Riikka

    AU - Rampelberg, Geert

    AU - Ras, Robin H.A.

    AU - Rauwel, Erwan

    AU - Roozeboom, Fred

    AU - Sajavaara, Timo

    AU - Salami, Hossein

    AU - Savin, Hele

    AU - Schneider, Nathanaelle

    AU - Seidel, Thomas E.

    AU - Sundqvist, Jonas

    AU - Suyatin, Dmitry

    AU - Törndahl, Tobias

    AU - van Ommen, J. Ruud

    AU - Wiemer, Claudia

    AU - Ylivaara, Oili

    AU - Yurkevich, Oksana

    N1 - CA2: BA1401 CA2: BA1403 Project code: 102086 PGN: 13 AU2: Grigoras, Kestutis AU2: Puurunen, Riikka AU2: Ylivaara, Oili

    PY - 2017/1/1

    Y1 - 2017/1/1

    N2 - Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name "molecular layering" (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency.

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    KW - Patents

    KW - Silica

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