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Roll-to-roll-imprinting

Research output: PatentPatent

Abstract

The present invention relates to roll-to-roll surface patterning by imprint method. A film of liquid phase resist is coated on a running web and subsequently brought into contact with a rolling replication tool with patterned features on its outer surface. In a simultaneous step, resist is 5 cured typically by heat or UV-light and patterned features on the rolling replication tool are replicated into the resist film during the contact with the replication tool. A major deficiency of conventional roll-to-roll imprinting is the generation of defects in the patterns due to trapped air. To overcome this limitation, the present invention describes a method and 10 apparatus to perform roll-to-roll imprinting under reduced-pressure or vacuum conditions.

Patent family as of 21.7.2026
EP4232873 A1, FI131751 B, FI20206041 A, JP2023547106 T2, US2023398728 AA, WO22084585 A1
Original languageEnglish
Patent numberFI131751 B1
IPCB29C59/02
Priority date21/10/20
Filing date21/10/20
Publication statusPublished - 7 Nov 2025
MoE publication typeH1 Granted patent

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