Rotation controlled imprinting

    Research output: Contribution to conferenceConference articleScientific

    Abstract

    Nanoimprint lithography is a potential technology for fabrication of large scale integration systems and nano scale patterning has been reported in many studies. In typical thermal imprint process mold temperature is raised above glass transition temperature (Tg) of the polymer during molding, and cooled down below Tg before de-molding. Step and Stamp Imprint Lithography (SSIL) is a versatile method to pattern various substrate materials by sequential thermal imprinting. In our system, a stamp with size of few millimeters can be used for patterning large areas up to 200 mm. Fabrication of bendable nickel stamps for Roll-to-Roll nanoimprinting and polymer stamps for UV-nanoimprinting has been reported. New rotating head introduces ability to control X/Y positioning and angular orientation.
    Original languageEnglish
    Publication statusPublished - 2010
    MoE publication typeNot Eligible
    Event36th International Conference on Micro- and Nano-Engineering, MNE 2010 - Genoa, Italy
    Duration: 19 Sep 201022 Sep 2010

    Conference

    Conference36th International Conference on Micro- and Nano-Engineering, MNE 2010
    Abbreviated titleMNE 2010
    Country/TerritoryItaly
    CityGenoa
    Period19/09/1022/09/10

    Keywords

    • Nanoimprinting
    • Step and Stamp imprint lithography

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