Rotation controlled imprinting

Research output: Contribution to conferenceConference articleScientific

Abstract

Nanoimprint lithography is a potential technology for fabrication of large scale integration systems and nano scale patterning has been reported in many studies. In typical thermal imprint process mold temperature is raised above glass transition temperature (Tg) of the polymer during molding, and cooled down below Tg before de-molding. Step and Stamp Imprint Lithography (SSIL) is a versatile method to pattern various substrate materials by sequential thermal imprinting. In our system, a stamp with size of few millimeters can be used for patterning large areas up to 200 mm. Fabrication of bendable nickel stamps for Roll-to-Roll nanoimprinting and polymer stamps for UV-nanoimprinting has been reported. New rotating head introduces ability to control X/Y positioning and angular orientation.
Original languageEnglish
Publication statusPublished - 2010
MoE publication typeNot Eligible
Event36th International Conference on Micro- and Nano-Engineering, MNE 2010 - Genoa, Italy
Duration: 19 Sep 201022 Sep 2010

Conference

Conference36th International Conference on Micro- and Nano-Engineering, MNE 2010
Abbreviated titleMNE 2010
CountryItaly
CityGenoa
Period19/09/1022/09/10

Keywords

  • Nanoimprinting
  • Step and Stamp imprint lithography

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  • Cite this

    Haatainen, T., Mäkelä, T., Ahopelto, J., & Lecarpentier, G. (2010). Rotation controlled imprinting. Paper presented at 36th International Conference on Micro- and Nano-Engineering, MNE 2010, Genoa, Italy.