Rotation controlled imprinting

Tomi Haatainen; Tapio Mäkelä; Jouni Ahopelto; Gilbert Lecarpentier

Rotation controlled imprinting

Tomi Haatainen, Tapio Mäkelä, Jouni Ahopelto, Gilbert Lecarpentier

SET Smart Equipment Technology

Research output: Contribution to conference › Conference article › Scientific

Abstract

Nanoimprint lithography is a potential technology for fabrication of large scale integration systems and nano scale patterning has been reported in many studies. In typical thermal imprint process mold temperature is raised above glass transition temperature (Tg) of the polymer during molding, and cooled down below Tg before de-molding. Step and Stamp Imprint Lithography (SSIL) is a versatile method to pattern various substrate materials by sequential thermal imprinting. In our system, a stamp with size of few millimeters can be used for patterning large areas up to 200 mm. Fabrication of bendable nickel stamps for Roll-to-Roll nanoimprinting and polymer stamps for UV-nanoimprinting has been reported. New rotating head introduces ability to control X/Y positioning and angular orientation.

Original language	English
Publication status	Published - 2010
MoE publication type	Not Eligible
Event	36th International Conference on Micro- and Nano-Engineering, MNE 2010 - Genoa, Italy Duration: 19 Sept 2010 → 22 Sept 2010

Conference

Conference	36th International Conference on Micro- and Nano-Engineering, MNE 2010
Abbreviated title	MNE 2010
Country/Territory	Italy
City	Genoa
Period	19/09/10 → 22/09/10

Keywords

Nanoimprinting
Step and Stamp imprint lithography

Cite this

@conference{09f1d500c87746a5a1e09fbc780fe108,

title = "Rotation controlled imprinting",

abstract = "Nanoimprint lithography is a potential technology for fabrication of large scale integration systems and nano scale patterning has been reported in many studies. In typical thermal imprint process mold temperature is raised above glass transition temperature (Tg) of the polymer during molding, and cooled down below Tg before de-molding. Step and Stamp Imprint Lithography (SSIL) is a versatile method to pattern various substrate materials by sequential thermal imprinting. In our system, a stamp with size of few millimeters can be used for patterning large areas up to 200 mm. Fabrication of bendable nickel stamps for Roll-to-Roll nanoimprinting and polymer stamps for UV-nanoimprinting has been reported. New rotating head introduces ability to control X/Y positioning and angular orientation.",

keywords = "Nanoimprinting, Step and Stamp imprint lithography",

author = "Tomi Haatainen and Tapio M{\"a}kel{\"a} and Jouni Ahopelto and Gilbert Lecarpentier",

note = "Project code: 21975; 36th International Conference on Micro- and Nano-Engineering, MNE 2010, MNE 2010 ; Conference date: 19-09-2010 Through 22-09-2010",

year = "2010",

language = "English",

}

TY - CONF

T1 - Rotation controlled imprinting

AU - Haatainen, Tomi

AU - Mäkelä, Tapio

AU - Ahopelto, Jouni

AU - Lecarpentier, Gilbert

N1 - Project code: 21975

PY - 2010

Y1 - 2010

N2 - Nanoimprint lithography is a potential technology for fabrication of large scale integration systems and nano scale patterning has been reported in many studies. In typical thermal imprint process mold temperature is raised above glass transition temperature (Tg) of the polymer during molding, and cooled down below Tg before de-molding. Step and Stamp Imprint Lithography (SSIL) is a versatile method to pattern various substrate materials by sequential thermal imprinting. In our system, a stamp with size of few millimeters can be used for patterning large areas up to 200 mm. Fabrication of bendable nickel stamps for Roll-to-Roll nanoimprinting and polymer stamps for UV-nanoimprinting has been reported. New rotating head introduces ability to control X/Y positioning and angular orientation.

AB - Nanoimprint lithography is a potential technology for fabrication of large scale integration systems and nano scale patterning has been reported in many studies. In typical thermal imprint process mold temperature is raised above glass transition temperature (Tg) of the polymer during molding, and cooled down below Tg before de-molding. Step and Stamp Imprint Lithography (SSIL) is a versatile method to pattern various substrate materials by sequential thermal imprinting. In our system, a stamp with size of few millimeters can be used for patterning large areas up to 200 mm. Fabrication of bendable nickel stamps for Roll-to-Roll nanoimprinting and polymer stamps for UV-nanoimprinting has been reported. New rotating head introduces ability to control X/Y positioning and angular orientation.

KW - Nanoimprinting

KW - Step and Stamp imprint lithography

M3 - Conference article

T2 - 36th International Conference on Micro- and Nano-Engineering, MNE 2010

Y2 - 19 September 2010 through 22 September 2010

ER -

Rotation controlled imprinting

Abstract

Conference

Keywords

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Cite this