Rotation controlled imprinting

Research output: Contribution to conferenceConference articleScientific

Abstract

Nanoimprint lithography is a potential technology for fabrication of large scale integration systems and nano scale patterning has been reported in many studies. In typical thermal imprint process mold temperature is raised above glass transition temperature (Tg) of the polymer during molding, and cooled down below Tg before de-molding. Step and Stamp Imprint Lithography (SSIL) is a versatile method to pattern various substrate materials by sequential thermal imprinting. In our system, a stamp with size of few millimeters can be used for patterning large areas up to 200 mm. Fabrication of bendable nickel stamps for Roll-to-Roll nanoimprinting and polymer stamps for UV-nanoimprinting has been reported. New rotating head introduces ability to control X/Y positioning and angular orientation.
Original languageEnglish
Publication statusPublished - 2010
MoE publication typeNot Eligible
Event36th International Conference on Micro- and Nano-Engineering, MNE 2010 - Genoa, Italy
Duration: 19 Sep 201022 Sep 2010

Conference

Conference36th International Conference on Micro- and Nano-Engineering, MNE 2010
Abbreviated titleMNE 2010
CountryItaly
CityGenoa
Period19/09/1022/09/10

Fingerprint

Molding
Nanoimprint lithography
Fabrication
LSI circuits
Polymers
Lithography
Nickel
Substrates
Temperature
Hot Temperature
Glass transition temperature

Keywords

  • Nanoimprinting
  • Step and Stamp imprint lithography

Cite this

Haatainen, T., Mäkelä, T., Ahopelto, J., & Lecarpentier, G. (2010). Rotation controlled imprinting. Paper presented at 36th International Conference on Micro- and Nano-Engineering, MNE 2010, Genoa, Italy.
Haatainen, Tomi ; Mäkelä, Tapio ; Ahopelto, Jouni ; Lecarpentier, Gilbert. / Rotation controlled imprinting. Paper presented at 36th International Conference on Micro- and Nano-Engineering, MNE 2010, Genoa, Italy.
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abstract = "Nanoimprint lithography is a potential technology for fabrication of large scale integration systems and nano scale patterning has been reported in many studies. In typical thermal imprint process mold temperature is raised above glass transition temperature (Tg) of the polymer during molding, and cooled down below Tg before de-molding. Step and Stamp Imprint Lithography (SSIL) is a versatile method to pattern various substrate materials by sequential thermal imprinting. In our system, a stamp with size of few millimeters can be used for patterning large areas up to 200 mm. Fabrication of bendable nickel stamps for Roll-to-Roll nanoimprinting and polymer stamps for UV-nanoimprinting has been reported. New rotating head introduces ability to control X/Y positioning and angular orientation.",
keywords = "Nanoimprinting, Step and Stamp imprint lithography",
author = "Tomi Haatainen and Tapio M{\"a}kel{\"a} and Jouni Ahopelto and Gilbert Lecarpentier",
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Haatainen, T, Mäkelä, T, Ahopelto, J & Lecarpentier, G 2010, 'Rotation controlled imprinting' Paper presented at 36th International Conference on Micro- and Nano-Engineering, MNE 2010, Genoa, Italy, 19/09/10 - 22/09/10, .

Rotation controlled imprinting. / Haatainen, Tomi; Mäkelä, Tapio; Ahopelto, Jouni; Lecarpentier, Gilbert.

2010. Paper presented at 36th International Conference on Micro- and Nano-Engineering, MNE 2010, Genoa, Italy.

Research output: Contribution to conferenceConference articleScientific

TY - CONF

T1 - Rotation controlled imprinting

AU - Haatainen, Tomi

AU - Mäkelä, Tapio

AU - Ahopelto, Jouni

AU - Lecarpentier, Gilbert

N1 - Project code: 21975

PY - 2010

Y1 - 2010

N2 - Nanoimprint lithography is a potential technology for fabrication of large scale integration systems and nano scale patterning has been reported in many studies. In typical thermal imprint process mold temperature is raised above glass transition temperature (Tg) of the polymer during molding, and cooled down below Tg before de-molding. Step and Stamp Imprint Lithography (SSIL) is a versatile method to pattern various substrate materials by sequential thermal imprinting. In our system, a stamp with size of few millimeters can be used for patterning large areas up to 200 mm. Fabrication of bendable nickel stamps for Roll-to-Roll nanoimprinting and polymer stamps for UV-nanoimprinting has been reported. New rotating head introduces ability to control X/Y positioning and angular orientation.

AB - Nanoimprint lithography is a potential technology for fabrication of large scale integration systems and nano scale patterning has been reported in many studies. In typical thermal imprint process mold temperature is raised above glass transition temperature (Tg) of the polymer during molding, and cooled down below Tg before de-molding. Step and Stamp Imprint Lithography (SSIL) is a versatile method to pattern various substrate materials by sequential thermal imprinting. In our system, a stamp with size of few millimeters can be used for patterning large areas up to 200 mm. Fabrication of bendable nickel stamps for Roll-to-Roll nanoimprinting and polymer stamps for UV-nanoimprinting has been reported. New rotating head introduces ability to control X/Y positioning and angular orientation.

KW - Nanoimprinting

KW - Step and Stamp imprint lithography

M3 - Conference article

ER -

Haatainen T, Mäkelä T, Ahopelto J, Lecarpentier G. Rotation controlled imprinting. 2010. Paper presented at 36th International Conference on Micro- and Nano-Engineering, MNE 2010, Genoa, Italy.