Saturation profile based conformality analysis for atomic layer deposition: Aluminum oxide in lateral high-aspect-ratio channels

Jihong Yim, Oili M.E. Ylivaara, Markku Ylilammi, Virpi Korpelainen, Eero Haimi, Emma Verkama, Mikko Utriainen, Riikka L. Puurunen (Corresponding Author)

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Physics & Astronomy

Chemical Compounds