Abstract
Diffractive optical elements can control light beyond the
capabilities of traditional optical components, which
offers great opportunities for numerous applications.
However, modern functionalities are related to even
smaller feature sizes, which causes remarkable challenges
for the structure measurements in the nanoscale. The
current methods are not optimal for the characterization
of diffractive structures. Optical scatterometry,
however, would be a good tool for non-destructive
characterization, and in particular, for inline process
control of the fabrication. In this paper, detailed
information about a goniometric scatterometer built at
MIKES (Centre for Metrology and Accreditation), basics of
the inverse problem approach for solving the parameters
of the structure and first measurements for confirming
the functionality of the scatterometer as well as the
capabilities of it are discussed.
| Original language | English |
|---|---|
| Article number | 044019 |
| Number of pages | 8 |
| Journal | Measurement Science and Technology |
| Volume | 25 |
| Issue number | 4 |
| DOIs | |
| Publication status | Published - 2014 |
| MoE publication type | A1 Journal article-refereed |
Keywords
- optical diffraction gratings
- metrology
- nanotechnology
- nanomaterials