Screening of ALD thin films for Cu diffusion barrier applications

Riikka L. Puurunen (Corresponding author), Jaakko Salonen, Arto Nurmela, Oili Ylivaara, Heikki Viljanen, Jyrki Molarius, Philippe Monnoyer, Sanna Yliniemi, Marko Pudas, Tero Lehto, Tero Lehto, Wei-Min Li

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

Original languageEnglish
Title of host publicationTechnical Program & Abstracts
PublisherAmerican Vacuum Society (AVS)
Publication statusPublished - 2013
Event13th International Conference on Atomic Layer Deposition, ALD 2013 - San Diego, California, San Diego, United States
Duration: 28 Jul 201331 Jul 2013
Conference number: 13

Conference

Conference13th International Conference on Atomic Layer Deposition, ALD 2013
Abbreviated titleALD 2013
CountryUnited States
CitySan Diego
Period28/07/1331/07/13

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