Screening of ALD thin films for Cu diffusion barrier applications

Riikka L. Puurunen (Corresponding author), Jaakko Salonen, Arto Nurmela, Oili Ylivaara, Heikki Viljanen, Jyrki Molarius, Philippe Monnoyer, Sanna Yliniemi, Marko Pudas, Tero Lehto, Tero Lehto, Wei-Min Li

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

Original languageEnglish
Title of host publicationTechnical Program & Abstracts
PublisherAmerican Vacuum Society AVS
Publication statusPublished - 2013
Event13th International Conference on Atomic Layer Deposition, ALD 2013 - San Diego, California, San Diego, United States
Duration: 28 Jul 201331 Jul 2013
Conference number: 13

Conference

Conference13th International Conference on Atomic Layer Deposition, ALD 2013
Abbreviated titleALD 2013
CountryUnited States
CitySan Diego
Period28/07/1331/07/13

Cite this

Puurunen, R. L., Salonen, J., Nurmela, A., Ylivaara, O., Viljanen, H., Molarius, J., ... Li, W-M. (2013). Screening of ALD thin films for Cu diffusion barrier applications. In Technical Program & Abstracts American Vacuum Society AVS.
Puurunen, Riikka L. ; Salonen, Jaakko ; Nurmela, Arto ; Ylivaara, Oili ; Viljanen, Heikki ; Molarius, Jyrki ; Monnoyer, Philippe ; Yliniemi, Sanna ; Pudas, Marko ; Lehto, Tero ; Lehto, Tero ; Li, Wei-Min. / Screening of ALD thin films for Cu diffusion barrier applications. Technical Program & Abstracts. American Vacuum Society AVS, 2013.
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title = "Screening of ALD thin films for Cu diffusion barrier applications",
author = "Puurunen, {Riikka L.} and Jaakko Salonen and Arto Nurmela and Oili Ylivaara and Heikki Viljanen and Jyrki Molarius and Philippe Monnoyer and Sanna Yliniemi and Marko Pudas and Tero Lehto and Tero Lehto and Wei-Min Li",
note = "Published abstract of a poster 74717 MECHALD",
year = "2013",
language = "English",
booktitle = "Technical Program & Abstracts",
publisher = "American Vacuum Society AVS",
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Puurunen, RL, Salonen, J, Nurmela, A, Ylivaara, O, Viljanen, H, Molarius, J, Monnoyer, P, Yliniemi, S, Pudas, M, Lehto, T, Lehto, T & Li, W-M 2013, Screening of ALD thin films for Cu diffusion barrier applications. in Technical Program & Abstracts. American Vacuum Society AVS, 13th International Conference on Atomic Layer Deposition, ALD 2013, San Diego, United States, 28/07/13.

Screening of ALD thin films for Cu diffusion barrier applications. / Puurunen, Riikka L. (Corresponding author); Salonen, Jaakko; Nurmela, Arto ; Ylivaara, Oili; Viljanen, Heikki; Molarius, Jyrki; Monnoyer, Philippe; Yliniemi, Sanna; Pudas, Marko; Lehto, Tero; Lehto, Tero; Li, Wei-Min.

Technical Program & Abstracts. American Vacuum Society AVS, 2013.

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

TY - CHAP

T1 - Screening of ALD thin films for Cu diffusion barrier applications

AU - Puurunen, Riikka L.

AU - Salonen, Jaakko

AU - Nurmela, Arto

AU - Ylivaara, Oili

AU - Viljanen, Heikki

AU - Molarius, Jyrki

AU - Monnoyer, Philippe

AU - Yliniemi, Sanna

AU - Pudas, Marko

AU - Lehto, Tero

AU - Lehto, Tero

AU - Li, Wei-Min

N1 - Published abstract of a poster 74717 MECHALD

PY - 2013

Y1 - 2013

M3 - Conference abstract in proceedings

BT - Technical Program & Abstracts

PB - American Vacuum Society AVS

ER -

Puurunen RL, Salonen J, Nurmela A, Ylivaara O, Viljanen H, Molarius J et al. Screening of ALD thin films for Cu diffusion barrier applications. In Technical Program & Abstracts. American Vacuum Society AVS. 2013