Abstract
We report the first quantum bit (qubit) device implemented on a foundry-compatible Si CMOS platform. The device, fabricated using SOI NanoWire MOSFET technology, is in essence a compact two-gate pFET. The qubit is encoded in the spin degree of freedom of a hole Quantum Dot (QD) defined by one of the Gates. Coherent spin manipulation is performed by means of an RF E-Field signal applied to the Gate itself. By demonstrating qubit functionality in a conventional transistor-like layout and process flow, this result bears relevance for the future up-scaling of qubit architectures, including the opportunity of their co-integration with “classical” Si CMOS control circuitry.
| Original language | English |
|---|---|
| Title of host publication | 2016 IEEE Symposium on VLSI Technology |
| Publisher | IEEE Institute of Electrical and Electronic Engineers |
| ISBN (Electronic) | 978-1-5090-0638-0 |
| DOIs | |
| Publication status | Published - Jun 2016 |
| MoE publication type | A4 Article in a conference publication |
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