Siloxane-based hybrid glass materials for binary and grayscale mask photoimaging

Ari Kärkkäinen (Corresponding Author), Juha Rantala, Arto Maaninen, Jabbour Ghassan, Michael Descour

Research output: Contribution to journalArticleScientificpeer-review

19 Citations (Scopus)

Abstract

Hybrid (organic–inorganic) glass materials, synthesized by the hybrid sol‐gel method, are demonstrated to have potential for fabrication of micro‐optical and opto‐mechanical structures by UV patterning in a single step. The Figure, an SEM image, shows a micro‐lens array photolithographically patterned in hybrid glass material using a grayscale photomask.
Original languageEnglish
Pages (from-to)535-540
JournalAdvanced Materials
Volume14
Issue number7
DOIs
Publication statusPublished - 2002
MoE publication typeA1 Journal article-refereed

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Siloxanes
Masks
Glass
Photomasks
Fabrication
Scanning electron microscopy

Cite this

Kärkkäinen, Ari ; Rantala, Juha ; Maaninen, Arto ; Ghassan, Jabbour ; Descour, Michael. / Siloxane-based hybrid glass materials for binary and grayscale mask photoimaging. In: Advanced Materials. 2002 ; Vol. 14, No. 7. pp. 535-540.
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Siloxane-based hybrid glass materials for binary and grayscale mask photoimaging. / Kärkkäinen, Ari (Corresponding Author); Rantala, Juha; Maaninen, Arto; Ghassan, Jabbour; Descour, Michael.

In: Advanced Materials, Vol. 14, No. 7, 2002, p. 535-540.

Research output: Contribution to journalArticleScientificpeer-review

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AU - Kärkkäinen, Ari

AU - Rantala, Juha

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AU - Descour, Michael

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