Siloxane-based hybrid glass materials for binary and grayscale mask photoimaging

Ari Kärkkäinen; Juha Rantala; Arto Maaninen; Jabbour Ghassan; Michael Descour

doi:10.1002/1521-4095(20020404)14:7<535::AID-ADMA535>3.0.CO;2-T

Siloxane-based hybrid glass materials for binary and grayscale mask photoimaging

Ari Kärkkäinen^*
, Juha Rantala
, Arto Maaninen
, Jabbour Ghassan
, Michael Descour

^*Corresponding author for this work

VTT Technical Research Centre of Finland

Research output: Contribution to journal › Article › Scientific › peer-review

21 Citations (Scopus)

Abstract

Hybrid (organic–inorganic) glass materials, synthesized by the hybrid sol‐gel method, are demonstrated to have potential for fabrication of micro‐optical and opto‐mechanical structures by UV patterning in a single step. The Figure, an SEM image, shows a micro‐lens array photolithographically patterned in hybrid glass material using a grayscale photomask.

Original language	English
Pages (from-to)	535-540
Journal	Advanced Materials
Volume	14
Issue number	7
DOIs	https://doi.org/10.1002/1521-4095(20020404)14:7<535::AID-ADMA535>3.0.CO;2-T
Publication status	Published - 2002
MoE publication type	A1 Journal article-refereed

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10.1002/1521-4095(20020404)14:7<535::AID-ADMA535>3.0.CO;2-T

Cite this

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title = "Siloxane-based hybrid glass materials for binary and grayscale mask photoimaging",

abstract = "Hybrid (organic–inorganic) glass materials, synthesized by the hybrid sol‐gel method, are demonstrated to have potential for fabrication of micro‐optical and opto‐mechanical structures by UV patterning in a single step. The Figure, an SEM image, shows a micro‐lens array photolithographically patterned in hybrid glass material using a grayscale photomask.",

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T1 - Siloxane-based hybrid glass materials for binary and grayscale mask photoimaging

AU - Kärkkäinen, Ari

AU - Rantala, Juha

AU - Maaninen, Arto

AU - Ghassan, Jabbour

AU - Descour, Michael

PY - 2002

Y1 - 2002

N2 - Hybrid (organic–inorganic) glass materials, synthesized by the hybrid sol‐gel method, are demonstrated to have potential for fabrication of micro‐optical and opto‐mechanical structures by UV patterning in a single step. The Figure, an SEM image, shows a micro‐lens array photolithographically patterned in hybrid glass material using a grayscale photomask.

AB - Hybrid (organic–inorganic) glass materials, synthesized by the hybrid sol‐gel method, are demonstrated to have potential for fabrication of micro‐optical and opto‐mechanical structures by UV patterning in a single step. The Figure, an SEM image, shows a micro‐lens array photolithographically patterned in hybrid glass material using a grayscale photomask.

U2 - 10.1002/1521-4095(20020404)14:7<535::AID-ADMA535>3.0.CO;2-T

DO - 10.1002/1521-4095(20020404)14:7<535::AID-ADMA535>3.0.CO;2-T

M3 - Article

SN - 0935-9648

VL - 14

SP - 535

EP - 540

JO - Advanced Materials

JF - Advanced Materials

IS - 7

ER -

Siloxane-based hybrid glass materials for binary and grayscale mask photoimaging

Abstract

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