Simultaneous qualitative analysis of volatile and nonvolatile organic contamination on silicon wafer by online pyrolysis mass spectrometry

Raimo A. Ketola, Jari Kiuru, Virpi Tarkiainen, Arto Kiviranta, Jaakko Räsänen, Heini Ritala, Simo Eränen

Research output: Contribution to journalArticleScientificpeer-review

Abstract

This paper presents a new analytical setup that aims for a qualitative analysis of both volatile and nonvolatile organic contamination simultaneously from one whole silicon wafer. The aim was to develop a screening method that can be used for the identification of the source(s) of organic contamination for quality control in the manufacturing process. The model compounds used in the analysis were a solvent (toluene), a photoresist, and a resist stripper solution. The instrumental setup consisted of a heatable chamber for sample handling and an online mass spectrometer for detection. The organic contamination could be directly desorbed from the surface of the silicon wafer (volatile organic components) or pyrolyzed/desorbed from the surface in air atmosphere at elevated temperature (nonvolatile components), and consequently detected by the mass spectrometer. The mass spectra and the ion chromatograms obtained by the mass spectrometer during the heating of the silicon wafer can be used for the identification of all organic compounds on the silicon wafer and thus, for the identification of a possible source of contamination.
Original languageEnglish
Pages (from-to)652 - 658
Number of pages7
JournalIEEE Transactions on Device and Materials Reliability
Volume5
Issue number4
DOIs
Publication statusPublished - 2005
MoE publication typeA1 Journal article-refereed

Fingerprint

Silicon wafers
Mass spectrometry
Pyrolysis
Mass spectrometers
Contamination
Toluene
Photoresists
Organic compounds
Quality control
Screening
Ions
Heating
Air
Temperature

Keywords

  • membrane-inlet mass spectrometry
  • non-volatile organic compound
  • online mass spectrometry
  • organic contamination
  • pyrolysis
  • silicon wafer
  • volatile organic compound

Cite this

Ketola, Raimo A. ; Kiuru, Jari ; Tarkiainen, Virpi ; Kiviranta, Arto ; Räsänen, Jaakko ; Ritala, Heini ; Eränen, Simo. / Simultaneous qualitative analysis of volatile and nonvolatile organic contamination on silicon wafer by online pyrolysis mass spectrometry. In: IEEE Transactions on Device and Materials Reliability. 2005 ; Vol. 5, No. 4. pp. 652 - 658.
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abstract = "This paper presents a new analytical setup that aims for a qualitative analysis of both volatile and nonvolatile organic contamination simultaneously from one whole silicon wafer. The aim was to develop a screening method that can be used for the identification of the source(s) of organic contamination for quality control in the manufacturing process. The model compounds used in the analysis were a solvent (toluene), a photoresist, and a resist stripper solution. The instrumental setup consisted of a heatable chamber for sample handling and an online mass spectrometer for detection. The organic contamination could be directly desorbed from the surface of the silicon wafer (volatile organic components) or pyrolyzed/desorbed from the surface in air atmosphere at elevated temperature (nonvolatile components), and consequently detected by the mass spectrometer. The mass spectra and the ion chromatograms obtained by the mass spectrometer during the heating of the silicon wafer can be used for the identification of all organic compounds on the silicon wafer and thus, for the identification of a possible source of contamination.",
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Simultaneous qualitative analysis of volatile and nonvolatile organic contamination on silicon wafer by online pyrolysis mass spectrometry. / Ketola, Raimo A.; Kiuru, Jari; Tarkiainen, Virpi; Kiviranta, Arto; Räsänen, Jaakko; Ritala, Heini; Eränen, Simo.

In: IEEE Transactions on Device and Materials Reliability, Vol. 5, No. 4, 2005, p. 652 - 658.

Research output: Contribution to journalArticleScientificpeer-review

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AU - Ketola, Raimo A.

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AB - This paper presents a new analytical setup that aims for a qualitative analysis of both volatile and nonvolatile organic contamination simultaneously from one whole silicon wafer. The aim was to develop a screening method that can be used for the identification of the source(s) of organic contamination for quality control in the manufacturing process. The model compounds used in the analysis were a solvent (toluene), a photoresist, and a resist stripper solution. The instrumental setup consisted of a heatable chamber for sample handling and an online mass spectrometer for detection. The organic contamination could be directly desorbed from the surface of the silicon wafer (volatile organic components) or pyrolyzed/desorbed from the surface in air atmosphere at elevated temperature (nonvolatile components), and consequently detected by the mass spectrometer. The mass spectra and the ion chromatograms obtained by the mass spectrometer during the heating of the silicon wafer can be used for the identification of all organic compounds on the silicon wafer and thus, for the identification of a possible source of contamination.

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