Abstract
Development of silicon-on-insulator (SOI) technology has enabled
fabrication of silicon heterostructures, where thin single crystalline Si film
is sandwiched between amorphous SiO2 layers. This kind of SiO2-Si-SiO2
quantum well provides a unique material system where electron density can be
tuned in a broad range due to high potential barriers formed by the SiO2
layers.
In this work we examine gate balance dependency of conductivity of double
gated SiO2-Si-SiO2 quantum wells
Original language | English |
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Title of host publication | Proceedings of the XLI Annual Conference of the Finnish Physics Society |
Publisher | University of Helsinki |
Pages | 175 |
Number of pages | 1 |
ISBN (Print) | 978-952-10-3236-3 |
Publication status | Published - 2007 |
MoE publication type | Not Eligible |
Event | Physics Days - Fysiikan Päivät 2007: 41st annual meeting of the Finnish Physical Society - Tallinn, Estonia Duration: 15 Mar 2007 → 17 Mar 2007 Conference number: 41 |
Publication series
Series | University of Helsinki: Department of Physics. Report Series in Physics |
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Number | HU-P-267 |
ISSN | 0355-5801 |
Conference
Conference | Physics Days - Fysiikan Päivät 2007 |
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Country/Territory | Estonia |
City | Tallinn |
Period | 15/03/07 → 17/03/07 |
Other | Organized together with the Estonian Physical Society |
Keywords
- silicon-on-insulator