Sol-gel hybrid glass diffractive elements by direct electron-beam exposure

Juha Rantala, N. Nordman, O. Nordman, Jouko Vähäkangas, Seppo Honkanen, Nasser Peyghambarian

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Abstract

The authors propose and demonstrate direct electron-beam writing of surface relief diffractive elements into hybrid inorganic/organic sol-gel glass films. The etch depth and phase delay can be controlled by the electron dose. The potential applications include multi-phase-level diffractive elements and apodised planar waveguide gratings.
Original languageEnglish
Pages (from-to)455-456
JournalElectronics Letters
Volume34
Issue number5
DOIs
Publication statusPublished - 1998
MoE publication typeA1 Journal article-refereed

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Rantala, J., Nordman, N., Nordman, O., Vähäkangas, J., Honkanen, S., & Peyghambarian, N. (1998). Sol-gel hybrid glass diffractive elements by direct electron-beam exposure. Electronics Letters, 34(5), 455-456. https://doi.org/10.1049/el:19980368