Sol-gel hybrid glass diffractive elements by direct electron-beam exposure

Juha Rantala; N. Nordman; O. Nordman; Jouko Vähäkangas; Seppo Honkanen; Nasser Peyghambarian

doi:10.1049/el:19980368

Sol-gel hybrid glass diffractive elements by direct electron-beam exposure

Juha Rantala, N. Nordman, O. Nordman, Jouko Vähäkangas, Seppo Honkanen, Nasser Peyghambarian

VTT Technical Research Centre of Finland

University of Arizona

Research output: Contribution to journal › Article › Scientific › peer-review

30 Citations (Scopus)

Abstract

The authors propose and demonstrate direct electron-beam writing of surface relief diffractive elements into hybrid inorganic/organic sol-gel glass films. The etch depth and phase delay can be controlled by the electron dose. The potential applications include multi-phase-level diffractive elements and apodised planar waveguide gratings.

Original language	English
Pages (from-to)	455-456
Journal	Electronics Letters
Volume	34
Issue number	5
DOIs	https://doi.org/10.1049/el:19980368
Publication status	Published - 1998
MoE publication type	A1 Journal article-refereed

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title = "Sol-gel hybrid glass diffractive elements by direct electron-beam exposure",

abstract = "The authors propose and demonstrate direct electron-beam writing of surface relief diffractive elements into hybrid inorganic/organic sol-gel glass films. The etch depth and phase delay can be controlled by the electron dose. The potential applications include multi-phase-level diffractive elements and apodised planar waveguide gratings.",

author = "Juha Rantala and N. Nordman and O. Nordman and Jouko V{\"a}h{\"a}kangas and Seppo Honkanen and Nasser Peyghambarian",

year = "1998",

doi = "10.1049/el:19980368",

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T1 - Sol-gel hybrid glass diffractive elements by direct electron-beam exposure

AU - Rantala, Juha

AU - Nordman, N.

AU - Nordman, O.

AU - Vähäkangas, Jouko

AU - Honkanen, Seppo

AU - Peyghambarian, Nasser

PY - 1998

Y1 - 1998

N2 - The authors propose and demonstrate direct electron-beam writing of surface relief diffractive elements into hybrid inorganic/organic sol-gel glass films. The etch depth and phase delay can be controlled by the electron dose. The potential applications include multi-phase-level diffractive elements and apodised planar waveguide gratings.

AB - The authors propose and demonstrate direct electron-beam writing of surface relief diffractive elements into hybrid inorganic/organic sol-gel glass films. The etch depth and phase delay can be controlled by the electron dose. The potential applications include multi-phase-level diffractive elements and apodised planar waveguide gratings.

U2 - 10.1049/el:19980368

DO - 10.1049/el:19980368

M3 - Article

SN - 0013-5194

VL - 34

SP - 455

EP - 456

JO - Electronics Letters

JF - Electronics Letters

IS - 5

ER -

Sol-gel hybrid glass diffractive elements by direct electron-beam exposure

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