Abstract
The authors propose and demonstrate direct electron-beam writing of surface relief diffractive elements into hybrid inorganic/organic sol-gel glass films. The etch depth and phase delay can be controlled by the electron dose. The potential applications include multi-phase-level diffractive elements and apodised planar waveguide gratings.
| Original language | English |
|---|---|
| Pages (from-to) | 455-456 |
| Journal | Electronics Letters |
| Volume | 34 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - 1998 |
| MoE publication type | A1 Journal article-refereed |