The optical attachment for transformation the spatial
characteristics of excimer laser has been experimentally
investigated. The laser beam of rectangular section with
sizes of 3 x 20 mm and divergence of 2 x 5 mrad after
passage of an optical attachment got the square form 20 ?
20 mm and equal divergence of 5 ? 5 mrad orthogonal
directions. It is shown, that application of such unit in
the facilities for microprocessing of materials
simplifies an optical path of illumination module, allows
to receive the optimum uniformity of irradiation (within
2 %) at reproductive image with micron accuracy in plane
of processed material and to mitigate the beam load on
optical elements due to suppression of influence of "hot"
|Series||Proceedings of SPIE|
|Conference||Optical Microlithography XXIX|
|Period||15/03/16 → 15/03/16|