Spatial conversion of excimer laser beam

Alexander Grishkanich, Alexander Zhevlakov, Sergey Kascheev, Veli Kujanpaa, Timo Savinainen

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    2 Citations (Scopus)

    Abstract

    The optical attachment for transformation the spatial characteristics of excimer laser has been experimentally investigated. The laser beam of rectangular section with sizes of 3 x 20 mm and divergence of 2 x 5 mrad after passage of an optical attachment got the square form 20 ? 20 mm and equal divergence of 5 ? 5 mrad orthogonal directions. It is shown, that application of such unit in the facilities for microprocessing of materials simplifies an optical path of illumination module, allows to receive the optimum uniformity of irradiation (within 2 %) at reproductive image with micron accuracy in plane of processed material and to mitigate the beam load on optical elements due to suppression of influence of "hot" points.
    Original languageEnglish
    Title of host publicationOptical Microlithography XXIX
    PublisherInternational Society for Optics and Photonics SPIE
    Number of pages6
    DOIs
    Publication statusPublished - 2016
    MoE publication typeA4 Article in a conference publication
    EventOptical Microlithography XXIX - San Jose, United States
    Duration: 15 Mar 201615 Mar 2016

    Publication series

    SeriesProceedings of SPIE
    Volume9780
    ISSN0277-786X

    Conference

    ConferenceOptical Microlithography XXIX
    CountryUnited States
    CitySan Jose
    Period15/03/1615/03/16

    Fingerprint

    excimer lasers
    attachment
    divergence
    laser beams
    optical paths
    modules
    illumination
    retarding
    irradiation

    Cite this

    Grishkanich, A., Zhevlakov, A., Kascheev, S., Kujanpaa, V., & Savinainen, T. (2016). Spatial conversion of excimer laser beam. In Optical Microlithography XXIX [97801L] International Society for Optics and Photonics SPIE. Proceedings of SPIE, Vol.. 9780 https://doi.org/10.1117/12.2219934
    Grishkanich, Alexander ; Zhevlakov, Alexander ; Kascheev, Sergey ; Kujanpaa, Veli ; Savinainen, Timo. / Spatial conversion of excimer laser beam. Optical Microlithography XXIX. International Society for Optics and Photonics SPIE, 2016. (Proceedings of SPIE, Vol. 9780).
    @inproceedings{9ba779e2b12347c681fb9d7418e3ace8,
    title = "Spatial conversion of excimer laser beam",
    abstract = "The optical attachment for transformation the spatial characteristics of excimer laser has been experimentally investigated. The laser beam of rectangular section with sizes of 3 x 20 mm and divergence of 2 x 5 mrad after passage of an optical attachment got the square form 20 ? 20 mm and equal divergence of 5 ? 5 mrad orthogonal directions. It is shown, that application of such unit in the facilities for microprocessing of materials simplifies an optical path of illumination module, allows to receive the optimum uniformity of irradiation (within 2 {\%}) at reproductive image with micron accuracy in plane of processed material and to mitigate the beam load on optical elements due to suppression of influence of {"}hot{"} points.",
    author = "Alexander Grishkanich and Alexander Zhevlakov and Sergey Kascheev and Veli Kujanpaa and Timo Savinainen",
    year = "2016",
    doi = "10.1117/12.2219934",
    language = "English",
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    Grishkanich, A, Zhevlakov, A, Kascheev, S, Kujanpaa, V & Savinainen, T 2016, Spatial conversion of excimer laser beam. in Optical Microlithography XXIX., 97801L, International Society for Optics and Photonics SPIE, Proceedings of SPIE, vol. 9780, Optical Microlithography XXIX, San Jose, United States, 15/03/16. https://doi.org/10.1117/12.2219934

    Spatial conversion of excimer laser beam. / Grishkanich, Alexander; Zhevlakov, Alexander; Kascheev, Sergey; Kujanpaa, Veli; Savinainen, Timo.

    Optical Microlithography XXIX. International Society for Optics and Photonics SPIE, 2016. 97801L (Proceedings of SPIE, Vol. 9780).

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

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    AU - Grishkanich, Alexander

    AU - Zhevlakov, Alexander

    AU - Kascheev, Sergey

    AU - Kujanpaa, Veli

    AU - Savinainen, Timo

    PY - 2016

    Y1 - 2016

    N2 - The optical attachment for transformation the spatial characteristics of excimer laser has been experimentally investigated. The laser beam of rectangular section with sizes of 3 x 20 mm and divergence of 2 x 5 mrad after passage of an optical attachment got the square form 20 ? 20 mm and equal divergence of 5 ? 5 mrad orthogonal directions. It is shown, that application of such unit in the facilities for microprocessing of materials simplifies an optical path of illumination module, allows to receive the optimum uniformity of irradiation (within 2 %) at reproductive image with micron accuracy in plane of processed material and to mitigate the beam load on optical elements due to suppression of influence of "hot" points.

    AB - The optical attachment for transformation the spatial characteristics of excimer laser has been experimentally investigated. The laser beam of rectangular section with sizes of 3 x 20 mm and divergence of 2 x 5 mrad after passage of an optical attachment got the square form 20 ? 20 mm and equal divergence of 5 ? 5 mrad orthogonal directions. It is shown, that application of such unit in the facilities for microprocessing of materials simplifies an optical path of illumination module, allows to receive the optimum uniformity of irradiation (within 2 %) at reproductive image with micron accuracy in plane of processed material and to mitigate the beam load on optical elements due to suppression of influence of "hot" points.

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    Grishkanich A, Zhevlakov A, Kascheev S, Kujanpaa V, Savinainen T. Spatial conversion of excimer laser beam. In Optical Microlithography XXIX. International Society for Optics and Photonics SPIE. 2016. 97801L. (Proceedings of SPIE, Vol. 9780). https://doi.org/10.1117/12.2219934