Spatial conversion of excimer laser beam

Alexander Grishkanich, Alexander Zhevlakov, Sergey Kascheev, Veli Kujanpaa, Timo Savinainen

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

2 Citations (Scopus)

Abstract

The optical attachment for transformation the spatial characteristics of excimer laser has been experimentally investigated. The laser beam of rectangular section with sizes of 3 x 20 mm and divergence of 2 x 5 mrad after passage of an optical attachment got the square form 20 ? 20 mm and equal divergence of 5 ? 5 mrad orthogonal directions. It is shown, that application of such unit in the facilities for microprocessing of materials simplifies an optical path of illumination module, allows to receive the optimum uniformity of irradiation (within 2 %) at reproductive image with micron accuracy in plane of processed material and to mitigate the beam load on optical elements due to suppression of influence of "hot" points.
Original languageEnglish
Title of host publicationOptical Microlithography XXIX
PublisherInternational Society for Optics and Photonics SPIE
Number of pages6
DOIs
Publication statusPublished - 2016
MoE publication typeA4 Article in a conference publication
EventOptical Microlithography XXIX - San Jose, United States
Duration: 15 Mar 201615 Mar 2016

Publication series

SeriesProceedings of SPIE
Volume9780
ISSN0277-786X

Conference

ConferenceOptical Microlithography XXIX
CountryUnited States
CitySan Jose
Period15/03/1615/03/16

Fingerprint

excimer lasers
attachment
divergence
laser beams
optical paths
modules
illumination
retarding
irradiation

Cite this

Grishkanich, A., Zhevlakov, A., Kascheev, S., Kujanpaa, V., & Savinainen, T. (2016). Spatial conversion of excimer laser beam. In Optical Microlithography XXIX [97801L] International Society for Optics and Photonics SPIE. Proceedings of SPIE, Vol.. 9780 https://doi.org/10.1117/12.2219934
Grishkanich, Alexander ; Zhevlakov, Alexander ; Kascheev, Sergey ; Kujanpaa, Veli ; Savinainen, Timo. / Spatial conversion of excimer laser beam. Optical Microlithography XXIX. International Society for Optics and Photonics SPIE, 2016. (Proceedings of SPIE, Vol. 9780).
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Grishkanich, A, Zhevlakov, A, Kascheev, S, Kujanpaa, V & Savinainen, T 2016, Spatial conversion of excimer laser beam. in Optical Microlithography XXIX., 97801L, International Society for Optics and Photonics SPIE, Proceedings of SPIE, vol. 9780, Optical Microlithography XXIX, San Jose, United States, 15/03/16. https://doi.org/10.1117/12.2219934

Spatial conversion of excimer laser beam. / Grishkanich, Alexander; Zhevlakov, Alexander; Kascheev, Sergey; Kujanpaa, Veli; Savinainen, Timo.

Optical Microlithography XXIX. International Society for Optics and Photonics SPIE, 2016. 97801L (Proceedings of SPIE, Vol. 9780).

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

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AU - Kujanpaa, Veli

AU - Savinainen, Timo

PY - 2016

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AB - The optical attachment for transformation the spatial characteristics of excimer laser has been experimentally investigated. The laser beam of rectangular section with sizes of 3 x 20 mm and divergence of 2 x 5 mrad after passage of an optical attachment got the square form 20 ? 20 mm and equal divergence of 5 ? 5 mrad orthogonal directions. It is shown, that application of such unit in the facilities for microprocessing of materials simplifies an optical path of illumination module, allows to receive the optimum uniformity of irradiation (within 2 %) at reproductive image with micron accuracy in plane of processed material and to mitigate the beam load on optical elements due to suppression of influence of "hot" points.

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Grishkanich A, Zhevlakov A, Kascheev S, Kujanpaa V, Savinainen T. Spatial conversion of excimer laser beam. In Optical Microlithography XXIX. International Society for Optics and Photonics SPIE. 2016. 97801L. (Proceedings of SPIE, Vol. 9780). https://doi.org/10.1117/12.2219934