Spatial micro-processing of mono-crystalline silicon with hybrid chemical-laser etching method in KOH with the use of fiber laser

A. Rosowski; H. Piili; R. Pawlak; Veli Kujanpää; A. Salminen

doi:10.2351/1.5061671

Spatial micro-processing of mono-crystalline silicon with hybrid chemical-laser etching method in KOH with the use of fiber laser

A. Rosowski, H. Piili, R. Pawlak, Veli Kujanpää, A. Salminen

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

3 Citations (Scopus)

Original language	English
Title of host publication	Proceedings of the 28th International Conference on Lasers and Electro-Optics, ICALEO 2009
Publisher	Laser Institute of America
Pages	950-958
ISBN (Electronic)	978-0-912035-59-8
DOIs	https://doi.org/10.2351/1.5061671
Publication status	Published - 2009
MoE publication type	A4 Article in a conference publication
Event	28th International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing ICALEO 2009 - Orlando, United States Duration: 2 Nov 2009 → 5 Nov 2009

Conference

Conference	28th International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing ICALEO 2009
Abbreviated title	ICALEO 2009
Country/Territory	United States
City	Orlando
Period	2/11/09 → 5/11/09

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

Access to Document

10.2351/1.5061671

Cite this

Rosowski, A., Piili, H., Pawlak, R., Kujanpää, V., & Salminen, A. (2009). Spatial micro-processing of mono-crystalline silicon with hybrid chemical-laser etching method in KOH with the use of fiber laser. In Proceedings of the 28th International Conference on Lasers and Electro-Optics, ICALEO 2009 (pp. 950-958). Laser Institute of America. https://doi.org/10.2351/1.5061671

@inproceedings{4ee5af7976594fbdb1ea9900df9afe08,

title = "Spatial micro-processing of mono-crystalline silicon with hybrid chemical-laser etching method in KOH with the use of fiber laser",

author = "A. Rosowski and H. Piili and R. Pawlak and Veli Kujanp{\"a}{\"a} and A. Salminen",

year = "2009",

doi = "10.2351/1.5061671",

language = "English",

pages = "950--958",

booktitle = "Proceedings of the 28th International Conference on Lasers and Electro-Optics, ICALEO 2009",

publisher = "Laser Institute of America",

address = "United States",

note = "28th International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing ICALEO 2009, ICALEO 2009 ; Conference date: 02-11-2009 Through 05-11-2009",

}

Rosowski, A, Piili, H, Pawlak, R, Kujanpää, V & Salminen, A 2009, Spatial micro-processing of mono-crystalline silicon with hybrid chemical-laser etching method in KOH with the use of fiber laser. in Proceedings of the 28th International Conference on Lasers and Electro-Optics, ICALEO 2009. Laser Institute of America, pp. 950-958, 28th International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing ICALEO 2009, Orlando, Florida, United States, 2/11/09. https://doi.org/10.2351/1.5061671

Spatial micro-processing of mono-crystalline silicon with hybrid chemical-laser etching method in KOH with the use of fiber laser. / Rosowski, A.; Piili, H.; Pawlak, R. et al.
Proceedings of the 28th International Conference on Lasers and Electro-Optics, ICALEO 2009. Laser Institute of America, 2009. p. 950-958.

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

TY - GEN

T1 - Spatial micro-processing of mono-crystalline silicon with hybrid chemical-laser etching method in KOH with the use of fiber laser

AU - Rosowski, A.

AU - Piili, H.

AU - Pawlak, R.

AU - Kujanpää, Veli

AU - Salminen, A.

PY - 2009

Y1 - 2009

U2 - 10.2351/1.5061671

DO - 10.2351/1.5061671

M3 - Conference article in proceedings

SP - 950

EP - 958

BT - Proceedings of the 28th International Conference on Lasers and Electro-Optics, ICALEO 2009

PB - Laser Institute of America

T2 - 28th International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing ICALEO 2009

Y2 - 2 November 2009 through 5 November 2009

ER -