Sputtering of Cu atoms by Ar ions

Jari Likonen, Matti Hautala

Research output: Contribution to journalArticleScientificpeer-review

2 Citations (Scopus)

Abstract

Sputtering of Cu single-crystal, polycrystal and amorphous targets by 5 keV Ar ions has been studied by the binary collision lattice simulation code Cosipo. The sputtering yields, angular distributions, energy distributions and the space distributions of the original positions of the sputtered Cu atoms have been calculated. The results are discussed within the framework of cascade generations and surface structure.
Original languageEnglish
Pages (from-to)137-150
JournalApplied Physics A: Solids and Surfaces
Volume45
Issue number2
Publication statusPublished - 1988
MoE publication typeA1 Journal article-refereed

Fingerprint

Sputtering
sputtering
Ions
Atoms
Angular distribution
Polycrystals
polycrystals
Surface structure
atoms
cascades
energy distribution
ions
angular distribution
Single crystals
collisions
single crystals
simulation

Keywords

  • angular distribution
  • target structure
  • target atom
  • collision cascade
  • random target

Cite this

Likonen, Jari ; Hautala, Matti. / Sputtering of Cu atoms by Ar ions. In: Applied Physics A: Solids and Surfaces. 1988 ; Vol. 45, No. 2. pp. 137-150.
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Likonen, J & Hautala, M 1988, 'Sputtering of Cu atoms by Ar ions', Applied Physics A: Solids and Surfaces, vol. 45, no. 2, pp. 137-150.

Sputtering of Cu atoms by Ar ions. / Likonen, Jari; Hautala, Matti.

In: Applied Physics A: Solids and Surfaces, Vol. 45, No. 2, 1988, p. 137-150.

Research output: Contribution to journalArticleScientificpeer-review

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T1 - Sputtering of Cu atoms by Ar ions

AU - Likonen, Jari

AU - Hautala, Matti

PY - 1988

Y1 - 1988

N2 - Sputtering of Cu single-crystal, polycrystal and amorphous targets by 5 keV Ar ions has been studied by the binary collision lattice simulation code Cosipo. The sputtering yields, angular distributions, energy distributions and the space distributions of the original positions of the sputtered Cu atoms have been calculated. The results are discussed within the framework of cascade generations and surface structure.

AB - Sputtering of Cu single-crystal, polycrystal and amorphous targets by 5 keV Ar ions has been studied by the binary collision lattice simulation code Cosipo. The sputtering yields, angular distributions, energy distributions and the space distributions of the original positions of the sputtered Cu atoms have been calculated. The results are discussed within the framework of cascade generations and surface structure.

KW - angular distribution

KW - target structure

KW - target atom

KW - collision cascade

KW - random target

M3 - Article

VL - 45

SP - 137

EP - 150

JO - Applied Physics A: Materials Science and Processing

JF - Applied Physics A: Materials Science and Processing

SN - 0947-8396

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