Sputtering of Cu atoms by Ar ions

Jari Likonen, Matti Hautala

    Research output: Contribution to journalArticleScientificpeer-review

    2 Citations (Scopus)


    Sputtering of Cu single-crystal, polycrystal and amorphous targets by 5 keV Ar ions has been studied by the binary collision lattice simulation code Cosipo. The sputtering yields, angular distributions, energy distributions and the space distributions of the original positions of the sputtered Cu atoms have been calculated. The results are discussed within the framework of cascade generations and surface structure.
    Original languageEnglish
    Pages (from-to)137-150
    JournalApplied Physics A: Solids and Surfaces
    Issue number2
    Publication statusPublished - 1988
    MoE publication typeA1 Journal article-refereed


    • angular distribution
    • target structure
    • target atom
    • collision cascade
    • random target


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