Sputtering of Cu atoms by Ar ions

Jari Likonen; Matti Hautala

doi:10.1007/BF02565201

Sputtering of Cu atoms by Ar ions

Jari Likonen
, Matti Hautala

University of Helsinki

Research output: Contribution to journal › Article › Scientific › peer-review

2 Citations (Scopus)

Abstract

Sputtering of Cu single-crystal, polycrystal and amorphous targets by ₅ keV Ar ions has been studied by the binary collision lattice simulation code Cosipo. The sputtering yields, angular distributions, energy distributions and the space distributions of the original positions of the sputtered Cu atoms have been calculated. The results are discussed within the framework of cascade generations and surface structure.

Original language	English
Pages (from-to)	137-150
Journal	Applied Physics A: Solids and Surfaces
Volume	45
Issue number	2
DOIs	https://doi.org/10.1007/BF02565201
Publication status	Published - 1988
MoE publication type	A1 Journal article-refereed

Keywords

angular distribution
target structure
target atom
collision cascade
random target

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10.1007/BF02565201

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title = "Sputtering of Cu atoms by Ar ions",

abstract = "Sputtering of Cu single-crystal, polycrystal and amorphous targets by 5 keV Ar ions has been studied by the binary collision lattice simulation code Cosipo. The sputtering yields, angular distributions, energy distributions and the space distributions of the original positions of the sputtered Cu atoms have been calculated. The results are discussed within the framework of cascade generations and surface structure.",

keywords = "angular distribution, target structure, target atom, collision cascade, random target",

author = "Jari Likonen and Matti Hautala",

year = "1988",

doi = "10.1007/BF02565201",

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journal = "Applied Physics A: Solids and Surfaces",

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T1 - Sputtering of Cu atoms by Ar ions

AU - Likonen, Jari

AU - Hautala, Matti

PY - 1988

Y1 - 1988

N2 - Sputtering of Cu single-crystal, polycrystal and amorphous targets by 5 keV Ar ions has been studied by the binary collision lattice simulation code Cosipo. The sputtering yields, angular distributions, energy distributions and the space distributions of the original positions of the sputtered Cu atoms have been calculated. The results are discussed within the framework of cascade generations and surface structure.

AB - Sputtering of Cu single-crystal, polycrystal and amorphous targets by 5 keV Ar ions has been studied by the binary collision lattice simulation code Cosipo. The sputtering yields, angular distributions, energy distributions and the space distributions of the original positions of the sputtered Cu atoms have been calculated. The results are discussed within the framework of cascade generations and surface structure.

KW - angular distribution

KW - target structure

KW - target atom

KW - collision cascade

KW - random target

UR - https://www.scopus.com/pages/publications/45949117303

U2 - 10.1007/BF02565201

DO - 10.1007/BF02565201

M3 - Article

SN - 0721-7250

VL - 45

SP - 137

EP - 150

JO - Applied Physics A: Solids and Surfaces

JF - Applied Physics A: Solids and Surfaces

IS - 2

ER -

Sputtering of Cu atoms by Ar ions

Abstract

Keywords

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