Stability and Residue Studies of Complexing Agents in SC-1 Bath

Heini Saloniemi, Simo Eränen, Raimo A. Ketola, Juha Kokkonen, Sari Lehto, Kaija Luomanperä, Pertti Vastamäki, Heli Sirén, Olli Anttila

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

Abstract

The stability of three complexing agents, HEDP, CDTA and DTPMP, in the SC-1 bath was determined. The feasibility of using capillary electrophoresis (CE) and electrospray ionization mass spectrometry (ESI/MS) for such studies was assessed. CE was employed for stability studies and ESI/MS was used to analyze small complexing agent concentrations relevant to residue studies. Chem. residues were studied by secondary ion mass spectrometry.
Original languageEnglish
Title of host publicationUltra Clean Processing of Silicon Surfaces VI
EditorsMarc Heyns, Paul Mertens, Marc Meuris
Pages41-44
DOIs
Publication statusPublished - 2003
MoE publication typeA4 Article in a conference publication
Event6th International Symposium on the Ultra Clean Processing of Silicon Surfaces, UCPSS 2002 - Oostende, Belgium
Duration: 16 Sep 200218 Sep 2002
Conference number: 6

Publication series

SeriesSolid State Phenomena
Volume92
ISSN1012-0394

Conference

Conference6th International Symposium on the Ultra Clean Processing of Silicon Surfaces, UCPSS 2002
Abbreviated titleUCPSS 2002
CountryBelgium
CityOostende
Period16/09/0218/09/02

Fingerprint

Capillary electrophoresis
Electrospray ionization
Mass spectrometry
Etidronic Acid
Secondary ion mass spectrometry
CDTA

Keywords

  • capillary electrophoresis
  • complexing agents
  • decomposition
  • electrospray ionization mass spectrometry
  • secondary-ion mass spectrometry
  • stability

Cite this

Saloniemi, H., Eränen, S., Ketola, R. A., Kokkonen, J., Lehto, S., Luomanperä, K., ... Anttila, O. (2003). Stability and Residue Studies of Complexing Agents in SC-1 Bath. In M. Heyns, P. Mertens, & M. Meuris (Eds.), Ultra Clean Processing of Silicon Surfaces VI (pp. 41-44). Solid State Phenomena, Vol.. 92 https://doi.org/10.4028/www.scientific.net/SSP.92.41
Saloniemi, Heini ; Eränen, Simo ; Ketola, Raimo A. ; Kokkonen, Juha ; Lehto, Sari ; Luomanperä, Kaija ; Vastamäki, Pertti ; Sirén, Heli ; Anttila, Olli. / Stability and Residue Studies of Complexing Agents in SC-1 Bath. Ultra Clean Processing of Silicon Surfaces VI. editor / Marc Heyns ; Paul Mertens ; Marc Meuris. 2003. pp. 41-44 (Solid State Phenomena, Vol. 92).
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title = "Stability and Residue Studies of Complexing Agents in SC-1 Bath",
abstract = "The stability of three complexing agents, HEDP, CDTA and DTPMP, in the SC-1 bath was determined. The feasibility of using capillary electrophoresis (CE) and electrospray ionization mass spectrometry (ESI/MS) for such studies was assessed. CE was employed for stability studies and ESI/MS was used to analyze small complexing agent concentrations relevant to residue studies. Chem. residues were studied by secondary ion mass spectrometry.",
keywords = "capillary electrophoresis, complexing agents, decomposition, electrospray ionization mass spectrometry, secondary-ion mass spectrometry, stability",
author = "Heini Saloniemi and Simo Er{\"a}nen and Ketola, {Raimo A.} and Juha Kokkonen and Sari Lehto and Kaija Luomanper{\"a} and Pertti Vastam{\"a}ki and Heli Sir{\'e}n and Olli Anttila",
note = "Project code: C2SU02062",
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language = "English",
isbn = "978-3-908450-78-8",
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Saloniemi, H, Eränen, S, Ketola, RA, Kokkonen, J, Lehto, S, Luomanperä, K, Vastamäki, P, Sirén, H & Anttila, O 2003, Stability and Residue Studies of Complexing Agents in SC-1 Bath. in M Heyns, P Mertens & M Meuris (eds), Ultra Clean Processing of Silicon Surfaces VI. Solid State Phenomena, vol. 92, pp. 41-44, 6th International Symposium on the Ultra Clean Processing of Silicon Surfaces, UCPSS 2002, Oostende, Belgium, 16/09/02. https://doi.org/10.4028/www.scientific.net/SSP.92.41

Stability and Residue Studies of Complexing Agents in SC-1 Bath. / Saloniemi, Heini; Eränen, Simo; Ketola, Raimo A.; Kokkonen, Juha; Lehto, Sari; Luomanperä, Kaija; Vastamäki, Pertti; Sirén, Heli; Anttila, Olli.

Ultra Clean Processing of Silicon Surfaces VI. ed. / Marc Heyns; Paul Mertens; Marc Meuris. 2003. p. 41-44 (Solid State Phenomena, Vol. 92).

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

TY - GEN

T1 - Stability and Residue Studies of Complexing Agents in SC-1 Bath

AU - Saloniemi, Heini

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AU - Kokkonen, Juha

AU - Lehto, Sari

AU - Luomanperä, Kaija

AU - Vastamäki, Pertti

AU - Sirén, Heli

AU - Anttila, Olli

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KW - capillary electrophoresis

KW - complexing agents

KW - decomposition

KW - electrospray ionization mass spectrometry

KW - secondary-ion mass spectrometry

KW - stability

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Saloniemi H, Eränen S, Ketola RA, Kokkonen J, Lehto S, Luomanperä K et al. Stability and Residue Studies of Complexing Agents in SC-1 Bath. In Heyns M, Mertens P, Meuris M, editors, Ultra Clean Processing of Silicon Surfaces VI. 2003. p. 41-44. (Solid State Phenomena, Vol. 92). https://doi.org/10.4028/www.scientific.net/SSP.92.41