Step and stamp imprint lithography

    Research output: Chapter in Book/Report/Conference proceedingChapter or book articleScientificpeer-review


    As the semiconductor industry continues to push to smaller device geometries, lithography becomes more and more a crucial process step. Traditionally, the semiconductor industry has relied on optical lithography and new generations of optical steppers are being developed for shorter wavelengths. Anyhow, in order to produce sub-50 nm lithography researches have started to look for new solutions, such as X-ray lithography, fast electron beam (e-beam) lithography and nanoimprint lithography (NIL).
    Original languageEnglish
    Title of host publicationAlternative Lithography
    Subtitle of host publicationUnleashing the Potentials of Nanotechnology
    EditorsClivia M. Sotomayor Torres
    Place of PublicationNew York
    ISBN (Electronic)978-1-4419-9204-8
    ISBN (Print)978-0-306-47858-1, 978-1-4613-4836-8
    Publication statusPublished - 2003
    MoE publication typeNot Eligible

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  • Cite this

    Ahopelto, J., & Haatainen, T. (2003). Step and stamp imprint lithography. In C. M. Sotomayor Torres (Ed.), Alternative Lithography: Unleashing the Potentials of Nanotechnology (pp. 103-115). Springer.