As the semiconductor industry continues to push to smaller device geometries, lithography becomes more and more a crucial process step. Traditionally, the semiconductor industry has relied on optical lithography and new generations of optical steppers are being developed for shorter wavelengths. Anyhow, in order to produce sub-50 nm lithography researches have started to look for new solutions, such as X-ray lithography, fast electron beam (e-beam) lithography and nanoimprint lithography (NIL).
|Title of host publication||Alternative Lithography|
|Subtitle of host publication||Unleashing the Potentials of Nanotechnology|
|Editors||Clivia M. Sotomayor Torres|
|Place of Publication||New York|
|ISBN (Print)||978-0-306-47858-1, 978-1-4613-4836-8|
|Publication status||Published - 2003|
|MoE publication type||Not Eligible|