Step and stamp imprint lithography

    Research output: Chapter in Book/Report/Conference proceedingChapter or book articleScientificpeer-review

    Abstract

    As the semiconductor industry continues to push to smaller device geometries, lithography becomes more and more a crucial process step. Traditionally, the semiconductor industry has relied on optical lithography and new generations of optical steppers are being developed for shorter wavelengths. Anyhow, in order to produce sub-50 nm lithography researches have started to look for new solutions, such as X-ray lithography, fast electron beam (e-beam) lithography and nanoimprint lithography (NIL).
    Original languageEnglish
    Title of host publicationAlternative Lithography
    Subtitle of host publicationUnleashing the Potentials of Nanotechnology
    EditorsClivia M. Sotomayor Torres
    Place of PublicationNew York
    PublisherSpringer
    Chapter6
    Pages103-115
    ISBN (Electronic)978-1-4419-9204-8
    ISBN (Print)978-0-306-47858-1, 978-1-4613-4836-8
    DOIs
    Publication statusPublished - 2003
    MoE publication typeNot Eligible

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    Cite this

    Ahopelto, J., & Haatainen, T. (2003). Step and stamp imprint lithography. In C. M. Sotomayor Torres (Ed.), Alternative Lithography: Unleashing the Potentials of Nanotechnology (pp. 103-115). Springer. https://doi.org/10.1007/978-1-4419-9204-8_6