In this work we describe a new method suitable for large area nanoimprint lithography. In step&stamp process the pattern on a stamp is transferred into a polymer layer on the substrate by repeating a step&stamp cycle. The method is demonstrated by imprinting matrices of test structures on polymer-coated 100 mm silicon wafers. A new polymer, PPM, is used as resist in the experiments. The polymer has been developed to fulfill the demands of imprint lithography. Patterns with sizes down to 400 nm were imprinted into either 100 nm or 340 nm thick PPM resist. After thinning in oxygen plasma, the resist layer is used as etching mask or for fabrication of interdigitated aluminum fingers by lift-off.
|Title of host publication||Emerging Lithographic Technologies IV|
|Publisher||International Society for Optics and Photonics SPIE|
|Publication status||Published - 2000|
|MoE publication type||A4 Article in a conference publication|
|Series||Proceedings of SPIE|
Haatainen, T., Ahopelto, J., Grueztner, G., Fink, M., & Pfeiffer, K. (2000). Step and stamp imprint lithography using a commercial flip chip bonder. In Emerging Lithographic Technologies IV (pp. 874-880). International Society for Optics and Photonics SPIE. Proceedings of SPIE, Vol.. 3997 https://doi.org/10.1117/12.390036