Step and stamp imprint lithography

Jouni Ahopelto; Tomi Haatainen

doi:10.1007/978-1-4419-9204-8_6

Step and stamp imprint lithography

Research output: Chapter in Book/Report/Conference proceeding › Chapter or book article › Scientific › peer-review

Abstract

As the semiconductor industry continues to push to smaller device geometries, lithography becomes more and more a crucial process step. Traditionally, the semiconductor industry has relied on optical lithography and new generations of optical steppers are being developed for shorter wavelengths. Anyhow, in order to produce sub-50 nm lithography researches have started to look for new solutions, such as X-ray lithography, fast electron beam (e-beam) lithography and nanoimprint lithography (NIL).

Original language	English
Title of host publication	Alternative Lithography
Subtitle of host publication	Unleashing the Potentials of Nanotechnology
Editors	Clivia M. Sotomayor Torres
Place of Publication	New York
Publisher	Springer
Chapter	6
Pages	103-115
ISBN (Electronic)	978-1-4419-9204-8
ISBN (Print)	978-0-306-47858-1, 978-1-4613-4836-8
DOIs	https://doi.org/10.1007/978-1-4419-9204-8_6
Publication status	Published - 2003
MoE publication type	Not Eligible

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10.1007/978-1-4419-9204-8_6

Cite this

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title = "Step and stamp imprint lithography",

abstract = "As the semiconductor industry continues to push to smaller device geometries, lithography becomes more and more a crucial process step. Traditionally, the semiconductor industry has relied on optical lithography and new generations of optical steppers are being developed for shorter wavelengths. Anyhow, in order to produce sub-50 nm lithography researches have started to look for new solutions, such as X-ray lithography, fast electron beam (e-beam) lithography and nanoimprint lithography (NIL).",

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AU - Haatainen, Tomi

PY - 2003

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AB - As the semiconductor industry continues to push to smaller device geometries, lithography becomes more and more a crucial process step. Traditionally, the semiconductor industry has relied on optical lithography and new generations of optical steppers are being developed for shorter wavelengths. Anyhow, in order to produce sub-50 nm lithography researches have started to look for new solutions, such as X-ray lithography, fast electron beam (e-beam) lithography and nanoimprint lithography (NIL).

U2 - 10.1007/978-1-4419-9204-8_6

DO - 10.1007/978-1-4419-9204-8_6

M3 - Chapter or book article

SN - 978-0-306-47858-1

SN - 978-1-4613-4836-8

SP - 103

EP - 115

BT - Alternative Lithography

A2 - Sotomayor Torres, Clivia M.

PB - Springer

CY - New York

ER -

Step and stamp imprint lithography

Abstract

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