| Original language | English |
|---|---|
| Publication status | Published - 22 Jan 2019 |
| MoE publication type | Not Eligible |
| Event | Physics@Veldhoven 2019 - The meeting venue of Physics@Veldhoven is the NH Conference Center Koningshof in Veldhoven., Veldhoeven, Netherlands Duration: 22 Jan 2019 → 23 Jan 2019 https://www.nwo.nl/en/news-and-events/events/physicsveldhoven/Programme |
Conference
| Conference | Physics@Veldhoven 2019 |
|---|---|
| Country | Netherlands |
| City | Veldhoeven |
| Period | 22/01/19 → 23/01/19 |
| Internet address |
Cite this
Utriainen, M., Arts, K., Vandalon, V., Gao, F., Puurunen, R. L., Kessels, E., & Knoops, H. (2019). Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3. Abstract from Physics@Veldhoven 2019, Veldhoeven, Netherlands.
@conference{b93bd270341d4be69a5eaa38adff753b,
title = "Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3",
author = "Mikko Utriainen and Karsten Arts and Vincent Vandalon and Feng Gao and Puurunen, {Riikka L.} and Erwin Kessels and Harm Knoops",
note = "Abstract reviewed; Physics@Veldhoven 2019 ; Conference date: 22-01-2019 Through 23-01-2019",
year = "2019",
month = "1",
day = "22",
language = "English",
url = "https://www.nwo.nl/en/news-and-events/events/physicsveldhoven/Programme",
}
Utriainen, M, Arts, K, Vandalon, V, Gao, F, Puurunen, RL, Kessels, E & Knoops, H 2019, 'Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3', Physics@Veldhoven 2019, Veldhoeven, Netherlands, 22/01/19 - 23/01/19.
Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3. / Utriainen, Mikko; Arts, Karsten (Corresponding author); Vandalon, Vincent; Gao, Feng; Puurunen, Riikka L.; Kessels, Erwin; Knoops, Harm.
2019. Abstract from Physics@Veldhoven 2019, Veldhoeven, Netherlands.Research output: Contribution to conference › Conference Abstract › Scientific › peer-review
TY - CONF
T1 - Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3
AU - Utriainen, Mikko
AU - Arts, Karsten
AU - Vandalon, Vincent
AU - Gao, Feng
AU - Puurunen, Riikka L.
AU - Kessels, Erwin
AU - Knoops, Harm
N1 - Abstract reviewed
PY - 2019/1/22
Y1 - 2019/1/22
UR - https://www.nwo.nl/en/news-and-events/events/physicsveldhoven
M3 - Conference Abstract
ER -
Utriainen M, Arts K, Vandalon V, Gao F, Puurunen RL, Kessels E et al. Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3. 2019. Abstract from Physics@Veldhoven 2019, Veldhoeven, Netherlands.