Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3

Mikko Utriainen, Karsten Arts (Corresponding author), Vincent Vandalon, Feng Gao, Riikka L. Puurunen, Erwin Kessels, Harm Knoops

    Research output: Contribution to conferenceConference AbstractScientificpeer-review

    Original languageEnglish
    Publication statusPublished - 22 Jan 2019
    MoE publication typeNot Eligible
    EventPhysics@Veldhoven 2019 - The meeting venue of Physics@Veldhoven is the NH Conference Center Koningshof in Veldhoven., Veldhoeven, Netherlands
    Duration: 22 Jan 201923 Jan 2019
    https://www.nwo.nl/en/news-and-events/events/physicsveldhoven/Programme

    Conference

    ConferencePhysics@Veldhoven 2019
    CountryNetherlands
    CityVeldhoeven
    Period22/01/1923/01/19
    Internet address

    Cite this

    Utriainen, M., Arts, K., Vandalon, V., Gao, F., Puurunen, R. L., Kessels, E., & Knoops, H. (2019). Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3. Abstract from Physics@Veldhoven 2019, Veldhoeven, Netherlands.
    Utriainen, Mikko ; Arts, Karsten ; Vandalon, Vincent ; Gao, Feng ; Puurunen, Riikka L. ; Kessels, Erwin ; Knoops, Harm. / Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3. Abstract from Physics@Veldhoven 2019, Veldhoeven, Netherlands.
    @conference{b93bd270341d4be69a5eaa38adff753b,
    title = "Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3",
    author = "Mikko Utriainen and Karsten Arts and Vincent Vandalon and Feng Gao and Puurunen, {Riikka L.} and Erwin Kessels and Harm Knoops",
    note = "Abstract reviewed; Physics@Veldhoven 2019 ; Conference date: 22-01-2019 Through 23-01-2019",
    year = "2019",
    month = "1",
    day = "22",
    language = "English",
    url = "https://www.nwo.nl/en/news-and-events/events/physicsveldhoven/Programme",

    }

    Utriainen, M, Arts, K, Vandalon, V, Gao, F, Puurunen, RL, Kessels, E & Knoops, H 2019, 'Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3', Physics@Veldhoven 2019, Veldhoeven, Netherlands, 22/01/19 - 23/01/19.

    Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3. / Utriainen, Mikko; Arts, Karsten (Corresponding author); Vandalon, Vincent; Gao, Feng; Puurunen, Riikka L.; Kessels, Erwin; Knoops, Harm.

    2019. Abstract from Physics@Veldhoven 2019, Veldhoeven, Netherlands.

    Research output: Contribution to conferenceConference AbstractScientificpeer-review

    TY - CONF

    T1 - Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3

    AU - Utriainen, Mikko

    AU - Arts, Karsten

    AU - Vandalon, Vincent

    AU - Gao, Feng

    AU - Puurunen, Riikka L.

    AU - Kessels, Erwin

    AU - Knoops, Harm

    N1 - Abstract reviewed

    PY - 2019/1/22

    Y1 - 2019/1/22

    UR - https://www.nwo.nl/en/news-and-events/events/physicsveldhoven

    M3 - Conference Abstract

    ER -

    Utriainen M, Arts K, Vandalon V, Gao F, Puurunen RL, Kessels E et al. Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3. 2019. Abstract from Physics@Veldhoven 2019, Veldhoeven, Netherlands.