Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3

Mikko Utriainen, Karsten Arts^*, Vincent Vandalon, Feng Gao, Riikka L. Puurunen, Erwin Kessels, Harm Knoops

^*Corresponding author for this work

Research output: Contribution to conference › Conference Abstract › Scientific › peer-review

Original language	English
Publication status	Published - 22 Jan 2019
MoE publication type	Not Eligible
Event	Physics@Veldhoven 2019 - The meeting venue of Physics@Veldhoven is the NH Conference Center Koningshof in Veldhoven., Veldhoeven, Netherlands Duration: 22 Jan 2019 → 23 Jan 2019 https://www.nwo.nl/en/news-and-events/events/physicsveldhoven/Programme

Conference	Physics@Veldhoven 2019
Country/Territory	Netherlands
City	Veldhoeven
Period	22/01/19 → 23/01/19
Internet address	https://www.nwo.nl/en/news-and-events/events/physicsveldhoven/Programme

Keywords

@conference{b93bd270341d4be69a5eaa38adff753b,

title = "Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3",

keywords = "OtaNano",

author = "Mikko Utriainen and Karsten Arts and Vincent Vandalon and Feng Gao and Puurunen, {Riikka L.} and Erwin Kessels and Harm Knoops",

note = "Abstract reviewed; Physics@Veldhoven 2019 ; Conference date: 22-01-2019 Through 23-01-2019",

year = "2019",

month = jan,

day = "22",

language = "English",

url = "https://www.nwo.nl/en/news-and-events/events/physicsveldhoven/Programme",

}

TY - CONF

T1 - Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3

AU - Utriainen, Mikko

AU - Arts, Karsten

AU - Vandalon, Vincent

AU - Gao, Feng

AU - Puurunen, Riikka L.

AU - Kessels, Erwin

AU - Knoops, Harm

N1 - Abstract reviewed

PY - 2019/1/22

Y1 - 2019/1/22

KW - OtaNano

UR - https://www.nwo.nl/en/news-and-events/events/physicsveldhoven

M3 - Conference Abstract

T2 - Physics@Veldhoven 2019

Y2 - 22 January 2019 through 23 January 2019

ER -