Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3

Mikko Utriainen; Karsten Arts; Vincent Vandalon; Feng Gao; Riikka L. Puurunen; Erwin Kessels; Harm Knoops

Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3

Mikko Utriainen, Karsten Arts (Corresponding author), Vincent Vandalon, Feng Gao, Riikka L. Puurunen, Erwin Kessels, Harm Knoops

BA191A MEMS

Research output: Contribution to conference › Conference Abstract › Scientific › peer-review

Original language	English
Publication status	Published - 22 Jan 2019
MoE publication type	Not Eligible
Event	Physics@Veldhoven 2019 - The meeting venue of Physics@Veldhoven is the NH Conference Center Koningshof in Veldhoven., Veldhoeven, Netherlands Duration: 22 Jan 2019 → 23 Jan 2019 https://www.nwo.nl/en/news-and-events/events/physicsveldhoven/Programme

Conference

Conference	Physics@Veldhoven 2019
Country	Netherlands
City	Veldhoeven
Period	22/01/19 → 23/01/19
Internet address	https://www.nwo.nl/en/news-and-events/events/physicsveldhoven/Programme

Keywords

OtaNano

Access to Document

https://www.nwo.nl/en/news-and-events/events/physicsveldhoven

Equipment

OtaNano

VTT Technical Research Centre of Finland

Facility/equipment: Facility

Cite this

Utriainen, M., Arts, K., Vandalon, V., Gao, F., Puurunen, R. L., Kessels, E., & Knoops, H. (2019). Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3. Abstract from Physics@Veldhoven 2019, Veldhoeven, Netherlands.

@conference{b93bd270341d4be69a5eaa38adff753b,

title = "Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3",

keywords = "OtaNano",

author = "Mikko Utriainen and Karsten Arts and Vincent Vandalon and Feng Gao and Puurunen, {Riikka L.} and Erwin Kessels and Harm Knoops",

note = "Abstract reviewed; Physics@Veldhoven 2019 ; Conference date: 22-01-2019 Through 23-01-2019",

year = "2019",

month = jan,

day = "22",

language = "English",

url = "https://www.nwo.nl/en/news-and-events/events/physicsveldhoven/Programme",

}

Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3. / Utriainen, Mikko; Arts, Karsten (Corresponding author); Vandalon, Vincent; Gao, Feng; Puurunen, Riikka L.; Kessels, Erwin; Knoops, Harm.

2019. Abstract from Physics@Veldhoven 2019, Veldhoeven, Netherlands.

Research output: Contribution to conference › Conference Abstract › Scientific › peer-review

TY - CONF

T1 - Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3

AU - Utriainen, Mikko

AU - Arts, Karsten

AU - Vandalon, Vincent

AU - Gao, Feng

AU - Puurunen, Riikka L.

AU - Kessels, Erwin

AU - Knoops, Harm

N1 - Abstract reviewed

PY - 2019/1/22

Y1 - 2019/1/22

KW - OtaNano

UR - https://www.nwo.nl/en/news-and-events/events/physicsveldhoven

M3 - Conference Abstract

T2 - Physics@Veldhoven 2019

Y2 - 22 January 2019 through 23 January 2019

ER -