Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3

Mikko Utriainen, Karsten Arts (Corresponding author), Vincent Vandalon, Feng Gao, Riikka L. Puurunen, Erwin Kessels, Harm Knoops

Research output: Contribution to conferenceConference AbstractScientificpeer-review

Original languageEnglish
Publication statusPublished - 22 Jan 2019
MoE publication typeNot Eligible
EventPhysics@Veldhoven 2019 - The meeting venue of Physics@Veldhoven is the NH Conference Center Koningshof in Veldhoven., Veldhoeven, Netherlands
Duration: 22 Jan 201923 Jan 2019
https://www.nwo.nl/en/news-and-events/events/physicsveldhoven/Programme

Conference

ConferencePhysics@Veldhoven 2019
CountryNetherlands
CityVeldhoeven
Period22/01/1923/01/19
Internet address

Keywords

  • OtaNano

Cite this

Utriainen, M., Arts, K., Vandalon, V., Gao, F., Puurunen, R. L., Kessels, E., & Knoops, H. (2019). Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3. Abstract from Physics@Veldhoven 2019, Veldhoeven, Netherlands.