Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3

Mikko Utriainen, Karsten Arts*, Vincent Vandalon, Feng Gao, Riikka L. Puurunen, Erwin Kessels, Harm Knoops

*Corresponding author for this work

    Research output: Contribution to conferenceConference AbstractScientificpeer-review

    Original languageEnglish
    Publication statusPublished - 22 Jan 2019
    MoE publication typeNot Eligible
    EventPhysics@Veldhoven 2019 - The meeting venue of Physics@Veldhoven is the NH Conference Center Koningshof in Veldhoven., Veldhoeven, Netherlands
    Duration: 22 Jan 201923 Jan 2019
    https://www.nwo.nl/en/news-and-events/events/physicsveldhoven/Programme

    Conference

    ConferencePhysics@Veldhoven 2019
    Country/TerritoryNetherlands
    CityVeldhoeven
    Period22/01/1923/01/19
    Internet address

    Keywords

    • OtaNano

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