Stress in atomic layer deposited aluminium oxide and titanium dioxide thin films

Oili Ylivaara (Corresponding author), Riikka L. Puurunen, Mikko Laitinen, Sakari Sintonen, Saima Ali, Timo Sajavaara, Harri Lipsanen, Jyrki Kiihamäki

    Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

    Fingerprint

    Dive into the research topics of 'Stress in atomic layer deposited aluminium oxide and titanium dioxide thin films'. Together they form a unique fingerprint.

    Engineering

    Material Science

    Chemistry