Stresses in ALD films: Aiming for zero stress thin films

Riina Ritasalo, Oili Ylivaara, Tero Pilvi, Tommi Suni

    Research output: Contribution to conferenceConference AbstractScientificpeer-review

    Original languageEnglish
    Publication statusPublished - 16 Oct 2018
    MoE publication typeNot Eligible
    Event4th International Conference on ALD Applications and 2018 China ALD Conference, CALD2018 - Shenzhen, China
    Duration: 14 Oct 201817 Oct 2018
    Conference number: 4
    http://www.c-ald.com

    Conference

    Conference4th International Conference on ALD Applications and 2018 China ALD Conference, CALD2018
    Abbreviated titleCALD2018
    CountryChina
    CityShenzhen
    Period14/10/1817/10/18
    Internet address

    Keywords

    • OtaNano

    Equipment

  • Cite this

    Ritasalo, R., Ylivaara, O., Pilvi, T., & Suni, T. (2018). Stresses in ALD films: Aiming for zero stress thin films. Abstract from 4th International Conference on ALD Applications and 2018 China ALD Conference, CALD2018 , Shenzhen, China.