Stresses in ALD films: Aiming for zero stress thin films

Riina Ritasalo; Oili Ylivaara; Tero Pilvi; Tommi Suni

Stresses in ALD films: Aiming for zero stress thin films

Riina Ritasalo
, Oili Ylivaara
, Tero Pilvi
, Tommi Suni

Picosun Oy
VTT (former employee or external)
University of Tokyo

Research output: Contribution to conference › Conference Abstract › Scientific › peer-review

Original language	English
Publication status	Published - 16 Oct 2018
MoE publication type	Not Eligible
Event	4th International Conference on ALD Applications and 2018 China ALD Conference, CALD2018 - Shenzhen, China Duration: 14 Oct 2018 → 17 Oct 2018 Conference number: 4 http://www.c-ald.com

Conference

Conference	4th International Conference on ALD Applications and 2018 China ALD Conference, CALD2018
Abbreviated title	CALD2018
Country/Territory	China
City	Shenzhen
Period	14/10/18 → 17/10/18
Internet address	http://www.c-ald.com

Keywords

OtaNano

OtaNano
VTT Technical Research Centre of Finland
Facility/equipment: Facility

Cite this

@conference{1ffb13615d2a45e0a31963574c0d6567,

title = "Stresses in ALD films: Aiming for zero stress thin films",

keywords = "OtaNano",

author = "Riina Ritasalo and Oili Ylivaara and Tero Pilvi and Tommi Suni",

note = "abstract reviewed; 4th International Conference on ALD Applications and 2018 China ALD Conference, CALD2018 , CALD2018 ; Conference date: 14-10-2018 Through 17-10-2018",

year = "2018",

month = oct,

day = "16",

language = "English",

url = "http://www.c-ald.com",

}

Stresses in ALD films: Aiming for zero stress thin films

Conference

Keywords

Equipment

OtaNano

Cite this