Stresses in ALD films: aiming for zero stress thin films

Riina Ritasalo; Oili M.E. Ylivaara; Tero Pilvi; Tommi Suni; Alexey Veselov

Stresses in ALD films: aiming for zero stress thin films

Riina Ritasalo, Oili M.E. Ylivaara, Tero Pilvi, Tommi Suni, Alexey Veselov

Research output: Contribution to conference › Conference Abstract › Scientific › peer-review

Original language	English
Publication status	Published - 14 May 2019
MoE publication type	Not Eligible
Event	14th International conference on Films and Coatings 2019 - Saint-Petersburg state electrotechnical University "LETI" named after V. I. Ulyanov (Lenin), St. Petersburg, Russian Federation Duration: 14 May 2019 → 16 May 2019 http://onlinereg.ru/site.php?go=294&lang=ENG

Conference

Conference	14th International conference on Films and Coatings 2019
Country/Territory	Russian Federation
City	St. Petersburg
Period	14/05/19 → 16/05/19
Internet address	http://onlinereg.ru/site.php?go=294&lang=ENG

Keywords

OtaNano

Cite this

@conference{b940f211bb1d48f48752a877f6e5f241,

title = "Stresses in ALD films: aiming for zero stress thin films",

keywords = "OtaNano",

author = "Riina Ritasalo and Ylivaara, {Oili M.E.} and Tero Pilvi and Tommi Suni and Alexey Veselov",

note = "Abstract and oral presentation based on the abstract; 14th International conference on Films and Coatings 2019 ; Conference date: 14-05-2019 Through 16-05-2019",

year = "2019",

month = may,

day = "14",

language = "English",

url = "http://onlinereg.ru/site.php?go=294&lang=ENG",

}

TY - CONF

T1 - Stresses in ALD films

T2 - 14th International conference on Films and Coatings 2019

AU - Ritasalo, Riina

AU - Ylivaara, Oili M.E.

AU - Pilvi, Tero

AU - Suni, Tommi

AU - Veselov, Alexey

N1 - Abstract and oral presentation based on the abstract

PY - 2019/5/14

Y1 - 2019/5/14

KW - OtaNano

UR - http://onlinereg.ru/site.php?go=294&page=6759&lang=ENG

M3 - Conference Abstract

Y2 - 14 May 2019 through 16 May 2019

ER -

Stresses in ALD films: aiming for zero stress thin films

Conference

Keywords

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Equipment

OtaNano

Cite this