Suitability of new polymer materials with adjustable glass temperature for nano-imprinting

Karl Pfeiffer, G. Bleidiessel, G. Gruetzner, H. Shultz, T. Hoffmann, H.-C. Scheer, C. Sotomayor-Torres, Jouni Ahopelto

Research output: Contribution to journalArticleScientificpeer-review

22 Citations (Scopus)

Abstract

A new class of copolymers potentially suitable for an imprint process is investigated. They are composed of methyl-methacrylate and a methacrylic acid, where the acid component increases the glass temperature and thus the thermal stability. The results obtained are compared to previous experiments with a methyl/butyl acrylate and the suitability for an imprint process is discussed. A modified processing sequence is proposed, where pressure is applied during the heating phase, resulting in superior imprint quality of, for example, periodic patterns.
Original languageEnglish
Pages (from-to)431-434
Number of pages4
JournalMicroelectronic Engineering
Volume46
Issue number1-4
DOIs
Publication statusPublished - 1999
MoE publication typeA1 Journal article-refereed

Fingerprint

Methacrylates
Polymers
Thermodynamic stability
Copolymers
Heating
Glass
acids
Acids
glass
polymers
acrylates
Processing
copolymers
thermal stability
Experiments
Temperature
heating
temperature
n-butyl acrylate
methacrylic acid

Cite this

Pfeiffer, Karl ; Bleidiessel, G. ; Gruetzner, G. ; Shultz, H. ; Hoffmann, T. ; Scheer, H.-C. ; Sotomayor-Torres, C. ; Ahopelto, Jouni. / Suitability of new polymer materials with adjustable glass temperature for nano-imprinting. In: Microelectronic Engineering. 1999 ; Vol. 46, No. 1-4. pp. 431-434.
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Pfeiffer, K, Bleidiessel, G, Gruetzner, G, Shultz, H, Hoffmann, T, Scheer, H-C, Sotomayor-Torres, C & Ahopelto, J 1999, 'Suitability of new polymer materials with adjustable glass temperature for nano-imprinting', Microelectronic Engineering, vol. 46, no. 1-4, pp. 431-434. https://doi.org/10.1016/S0167-9317(99)00126-4

Suitability of new polymer materials with adjustable glass temperature for nano-imprinting. / Pfeiffer, Karl; Bleidiessel, G.; Gruetzner, G.; Shultz, H.; Hoffmann, T.; Scheer, H.-C.; Sotomayor-Torres, C.; Ahopelto, Jouni.

In: Microelectronic Engineering, Vol. 46, No. 1-4, 1999, p. 431-434.

Research output: Contribution to journalArticleScientificpeer-review

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AU - Pfeiffer, Karl

AU - Bleidiessel, G.

AU - Gruetzner, G.

AU - Shultz, H.

AU - Hoffmann, T.

AU - Scheer, H.-C.

AU - Sotomayor-Torres, C.

AU - Ahopelto, Jouni

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AB - A new class of copolymers potentially suitable for an imprint process is investigated. They are composed of methyl-methacrylate and a methacrylic acid, where the acid component increases the glass temperature and thus the thermal stability. The results obtained are compared to previous experiments with a methyl/butyl acrylate and the suitability for an imprint process is discussed. A modified processing sequence is proposed, where pressure is applied during the heating phase, resulting in superior imprint quality of, for example, periodic patterns.

U2 - 10.1016/S0167-9317(99)00126-4

DO - 10.1016/S0167-9317(99)00126-4

M3 - Article

VL - 46

SP - 431

EP - 434

JO - Microelectronic Engineering

JF - Microelectronic Engineering

SN - 0167-9317

IS - 1-4

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