TY - JOUR
T1 - Suitability of new polymer materials with adjustable glass temperature for nano-imprinting
AU - Pfeiffer, Karl
AU - Bleidiessel, G.
AU - Gruetzner, G.
AU - Shultz, H.
AU - Hoffmann, T.
AU - Scheer, H.-C.
AU - Sotomayor-Torres, C.
AU - Ahopelto, Jouni
PY - 1999
Y1 - 1999
N2 - A new class of copolymers potentially suitable for an imprint process is investigated. They are composed of methyl-methacrylate and a methacrylic acid, where the acid component increases the glass temperature and thus the thermal stability. The results obtained are compared to previous experiments with a methyl/butyl acrylate and the suitability for an imprint process is discussed. A modified processing sequence is proposed, where pressure is applied during the heating phase, resulting in superior imprint quality of, for example, periodic patterns.
AB - A new class of copolymers potentially suitable for an imprint process is investigated. They are composed of methyl-methacrylate and a methacrylic acid, where the acid component increases the glass temperature and thus the thermal stability. The results obtained are compared to previous experiments with a methyl/butyl acrylate and the suitability for an imprint process is discussed. A modified processing sequence is proposed, where pressure is applied during the heating phase, resulting in superior imprint quality of, for example, periodic patterns.
U2 - 10.1016/S0167-9317(99)00126-4
DO - 10.1016/S0167-9317(99)00126-4
M3 - Article
SN - 0167-9317
VL - 46
SP - 431
EP - 434
JO - Microelectronic Engineering
JF - Microelectronic Engineering
IS - 1-4
ER -