Suitability of new polymer materials with adjustable glass temperature for nano-imprinting

Karl Pfeiffer; G. Bleidiessel; G. Gruetzner; H. Shultz; T. Hoffmann; H.-C. Scheer; C. Sotomayor-Torres; Jouni Ahopelto

doi:10.1016/S0167-9317(99)00126-4

Suitability of new polymer materials with adjustable glass temperature for nano-imprinting

Karl Pfeiffer
, G. Bleidiessel
, G. Gruetzner
, H. Shultz
, T. Hoffmann
, H.-C. Scheer
, C. Sotomayor-Torres
, Jouni Ahopelto

Micro Resist Technology GmbH
University of Wuppertal

Research output: Contribution to journal › Article › Scientific › peer-review

23 Citations (Scopus)

Abstract

A new class of copolymers potentially suitable for an imprint process is investigated. They are composed of methyl-methacrylate and a methacrylic acid, where the acid component increases the glass temperature and thus the thermal stability. The results obtained are compared to previous experiments with a methyl/butyl acrylate and the suitability for an imprint process is discussed. A modified processing sequence is proposed, where pressure is applied during the heating phase, resulting in superior imprint quality of, for example, periodic patterns.

Original language	English
Pages (from-to)	431-434
Number of pages	4
Journal	Microelectronic Engineering
Volume	46
Issue number	1-4
DOIs	https://doi.org/10.1016/S0167-9317(99)00126-4
Publication status	Published - 1999
MoE publication type	A1 Journal article-refereed

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10.1016/S0167-9317(99)00126-4

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title = "Suitability of new polymer materials with adjustable glass temperature for nano-imprinting",

abstract = "A new class of copolymers potentially suitable for an imprint process is investigated. They are composed of methyl-methacrylate and a methacrylic acid, where the acid component increases the glass temperature and thus the thermal stability. The results obtained are compared to previous experiments with a methyl/butyl acrylate and the suitability for an imprint process is discussed. A modified processing sequence is proposed, where pressure is applied during the heating phase, resulting in superior imprint quality of, for example, periodic patterns.",

author = "Karl Pfeiffer and G. Bleidiessel and G. Gruetzner and H. Shultz and T. Hoffmann and H.-C. Scheer and C. Sotomayor-Torres and Jouni Ahopelto",

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T1 - Suitability of new polymer materials with adjustable glass temperature for nano-imprinting

AU - Pfeiffer, Karl

AU - Bleidiessel, G.

AU - Gruetzner, G.

AU - Shultz, H.

AU - Hoffmann, T.

AU - Scheer, H.-C.

AU - Sotomayor-Torres, C.

AU - Ahopelto, Jouni

PY - 1999

Y1 - 1999

N2 - A new class of copolymers potentially suitable for an imprint process is investigated. They are composed of methyl-methacrylate and a methacrylic acid, where the acid component increases the glass temperature and thus the thermal stability. The results obtained are compared to previous experiments with a methyl/butyl acrylate and the suitability for an imprint process is discussed. A modified processing sequence is proposed, where pressure is applied during the heating phase, resulting in superior imprint quality of, for example, periodic patterns.

AB - A new class of copolymers potentially suitable for an imprint process is investigated. They are composed of methyl-methacrylate and a methacrylic acid, where the acid component increases the glass temperature and thus the thermal stability. The results obtained are compared to previous experiments with a methyl/butyl acrylate and the suitability for an imprint process is discussed. A modified processing sequence is proposed, where pressure is applied during the heating phase, resulting in superior imprint quality of, for example, periodic patterns.

U2 - 10.1016/S0167-9317(99)00126-4

DO - 10.1016/S0167-9317(99)00126-4

M3 - Article

SN - 0167-9317

VL - 46

SP - 431

EP - 434

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 1-4

ER -

Suitability of new polymer materials with adjustable glass temperature for nano-imprinting

Abstract

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