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Superconducting TiN through-silicon-vias for quantum technology

  • Kestutis Grigoras*
  • , Slawomir Simbierowicz
  • , Leif Grönberg
  • , Joonas Govenius
  • , Visa Vesterinen
  • , Mika Prunnila
  • , Juha Hassel
  • *Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

Abstract

Through-silicon vias (TSVs) can be used to route signals and to obtain effective grounding in microwave circuits. The coating of the TSVs with a superconducting material is a challenge because of the high aspect ratio of the structures. In this paper, we present successful fabrication of superconducting 60μm diameter TSVs, coated by atomic layer deposition (ALD) of titanium nitride. The critical temperature Tc is approximately 1.6 K.

Original languageEnglish
Title of host publication2019 IEEE 21st Electronics Packaging Technology Conference, EPTC 2019
PublisherIEEE Institute of Electrical and Electronic Engineers
Pages81-82
ISBN (Electronic)978-1-7281-3835-0
DOIs
Publication statusPublished - Dec 2019
MoE publication typeA4 Article in a conference publication
Event21st IEEE Electronics Packaging Technology Conference, EPTC 2019 - Singapore, Singapore
Duration: 4 Dec 20196 Dec 2019

Conference

Conference21st IEEE Electronics Packaging Technology Conference, EPTC 2019
Country/TerritorySingapore
CitySingapore
Period4/12/196/12/19

Funding

We acknowledge Paula Holmlund for technical assistance. This work was supported by the EU Flagship on Quantum Technology project OpenSuperQ (820363).

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