The effect of iridium precursor on oxide-supported iridium catalysts prepared by atomic layer deposition

H. Vuori (Corresponding Author), Antti Pasanen, M. Lindblad, M. V. Niemelä, A. O. I. Krause

    Research output: Contribution to journalArticleScientificpeer-review

    11 Citations (Scopus)

    Abstract

    Alumina, silica and beta zeolite supported iridium catalysts were prepared by atomic layer deposition (ALD) from two different metal precursors, Ir(acac)3 and Ir(thd)(COD). The use of Ir(thd)(COD) in ALD is reported for the first time. The aim was to investigate the effect of the precursor on catalyst surface species, chemical state and characteristics. Controllable ALD reaction was successful with both iridium precursors on alumina and with Ir(acac)3 on β zeolite. On these catalysts, iridium particle sizes were very small (1–3 nm). Instead, some thermal decomposition of both precursors was observed during deposition on silica. At conditions, where no or very little decomposition of the precursors took place, the differences in the chemical state and characteristics of the as-prepared Ir/support samples were negligible, In ALD, Ir(acac)3 is slightly more stable at high deposition temperatures (>200 °C) while Ir(thd)(COD) enables the utilization of larger temperature range since it vaporizes at lower temperature compared to Ir(acac)3. The results thus indicate that Ir(thd)(COD) is a suitable new precursor for ALD.
    Original languageEnglish
    Pages (from-to)4204-4210
    Number of pages7
    JournalApplied Surface Science
    Volume257
    Issue number9
    DOIs
    Publication statusPublished - 2011
    MoE publication typeA1 Journal article-refereed

    Keywords

    • iridium catalysts
    • ALD
    • metal precursor
    • catalyst characterization

    Fingerprint Dive into the research topics of 'The effect of iridium precursor on oxide-supported iridium catalysts prepared by atomic layer deposition'. Together they form a unique fingerprint.

    Cite this