The effect of target structure on sputtering of Cu atoms by Ar ions

Matti Hautala, Jari Likonen

    Research output: Contribution to journalArticleScientificpeer-review

    Abstract

    Sputtering of Cu single-crystal, polycrystal and amorphous targets by 5 keV Ar ions has been studied by the binary collision lattice simulation code Cosipo. The sputtering yields, angular distributions and the space distributions of the original positions of the sputtered Cu atoms have been calculated. The results are discussed within the framework of cascade generations.
    Original languageEnglish
    Pages (from-to)383-387
    JournalPhysics Letters A
    Volume124
    Issue number6-7
    DOIs
    Publication statusPublished - 1987
    MoE publication typeA1 Journal article-refereed

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    sputtering
    polycrystals
    atoms
    cascades
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    angular distribution
    collisions
    single crystals
    simulation

    Cite this

    @article{f76ac58789624b01bb3c22b63e867671,
    title = "The effect of target structure on sputtering of Cu atoms by Ar ions",
    abstract = "Sputtering of Cu single-crystal, polycrystal and amorphous targets by 5 keV Ar ions has been studied by the binary collision lattice simulation code Cosipo. The sputtering yields, angular distributions and the space distributions of the original positions of the sputtered Cu atoms have been calculated. The results are discussed within the framework of cascade generations.",
    author = "Matti Hautala and Jari Likonen",
    year = "1987",
    doi = "10.1016/0375-9601(87)90033-8",
    language = "English",
    volume = "124",
    pages = "383--387",
    journal = "Physics Letters A",
    issn = "0375-9601",
    publisher = "Elsevier",
    number = "6-7",

    }

    The effect of target structure on sputtering of Cu atoms by Ar ions. / Hautala, Matti; Likonen, Jari.

    In: Physics Letters A, Vol. 124, No. 6-7, 1987, p. 383-387.

    Research output: Contribution to journalArticleScientificpeer-review

    TY - JOUR

    T1 - The effect of target structure on sputtering of Cu atoms by Ar ions

    AU - Hautala, Matti

    AU - Likonen, Jari

    PY - 1987

    Y1 - 1987

    N2 - Sputtering of Cu single-crystal, polycrystal and amorphous targets by 5 keV Ar ions has been studied by the binary collision lattice simulation code Cosipo. The sputtering yields, angular distributions and the space distributions of the original positions of the sputtered Cu atoms have been calculated. The results are discussed within the framework of cascade generations.

    AB - Sputtering of Cu single-crystal, polycrystal and amorphous targets by 5 keV Ar ions has been studied by the binary collision lattice simulation code Cosipo. The sputtering yields, angular distributions and the space distributions of the original positions of the sputtered Cu atoms have been calculated. The results are discussed within the framework of cascade generations.

    U2 - 10.1016/0375-9601(87)90033-8

    DO - 10.1016/0375-9601(87)90033-8

    M3 - Article

    VL - 124

    SP - 383

    EP - 387

    JO - Physics Letters A

    JF - Physics Letters A

    SN - 0375-9601

    IS - 6-7

    ER -