The effect of target structure on sputtering of Cu atoms by Ar ions

Matti Hautala, Jari Likonen

    Research output: Contribution to journalArticleScientificpeer-review

    Abstract

    Sputtering of Cu single-crystal, polycrystal and amorphous targets by 5 keV Ar ions has been studied by the binary collision lattice simulation code Cosipo. The sputtering yields, angular distributions and the space distributions of the original positions of the sputtered Cu atoms have been calculated. The results are discussed within the framework of cascade generations.
    Original languageEnglish
    Pages (from-to)383-387
    JournalPhysics Letters A
    Volume124
    Issue number6-7
    DOIs
    Publication statusPublished - 1987
    MoE publication typeA1 Journal article-refereed

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