The effect of target structure on sputtering of Cu atoms by Ar ions

Matti Hautala; Jari Likonen

doi:10.1016/0375-9601(87)90033-8

The effect of target structure on sputtering of Cu atoms by Ar ions

Matti Hautala, Jari Likonen

University of Helsinki

Research output: Contribution to journal › Article › Scientific › peer-review

Abstract

Sputtering of Cu single-crystal, polycrystal and amorphous targets by 5 keV Ar ions has been studied by the binary collision lattice simulation code Cosipo. The sputtering yields, angular distributions and the space distributions of the original positions of the sputtered Cu atoms have been calculated. The results are discussed within the framework of cascade generations.

Original language	English
Pages (from-to)	383-387
Journal	Physics Letters A
Volume	124
Issue number	6-7
DOIs	https://doi.org/10.1016/0375-9601(87)90033-8
Publication status	Published - 1987
MoE publication type	A1 Journal article-refereed

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10.1016/0375-9601(87)90033-8

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title = "The effect of target structure on sputtering of Cu atoms by Ar ions",

abstract = "Sputtering of Cu single-crystal, polycrystal and amorphous targets by 5 keV Ar ions has been studied by the binary collision lattice simulation code Cosipo. The sputtering yields, angular distributions and the space distributions of the original positions of the sputtered Cu atoms have been calculated. The results are discussed within the framework of cascade generations.",

author = "Matti Hautala and Jari Likonen",

year = "1987",

doi = "10.1016/0375-9601(87)90033-8",

language = "English",

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journal = "Physics Letters A",

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T1 - The effect of target structure on sputtering of Cu atoms by Ar ions

AU - Hautala, Matti

AU - Likonen, Jari

PY - 1987

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N2 - Sputtering of Cu single-crystal, polycrystal and amorphous targets by 5 keV Ar ions has been studied by the binary collision lattice simulation code Cosipo. The sputtering yields, angular distributions and the space distributions of the original positions of the sputtered Cu atoms have been calculated. The results are discussed within the framework of cascade generations.

AB - Sputtering of Cu single-crystal, polycrystal and amorphous targets by 5 keV Ar ions has been studied by the binary collision lattice simulation code Cosipo. The sputtering yields, angular distributions and the space distributions of the original positions of the sputtered Cu atoms have been calculated. The results are discussed within the framework of cascade generations.

U2 - 10.1016/0375-9601(87)90033-8

DO - 10.1016/0375-9601(87)90033-8

M3 - Article

SN - 0375-9601

VL - 124

SP - 383

EP - 387

JO - Physics Letters A

JF - Physics Letters A

IS - 6-7

ER -

The effect of target structure on sputtering of Cu atoms by Ar ions

Abstract

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