The use of automatic demolding in nanoimprint lithography processes

S. Merino, H. Schift, A. Retolaza, Tomi Haatainen

    Research output: Contribution to journalArticleScientificpeer-review

    21 Citations (Scopus)

    Abstract

    Three different setups for automatic demolding in nanoimprint, including air induced demolding and fast and slow demolding, are studied for different stamps designs, and compared with standard manual demolding.
    A comparison between the setups shows differences in quality between polymers of different molecular weight, and of different grating periods.
    Original languageEnglish
    Pages (from-to)958-962
    JournalMicroelectronic Engineering
    Volume84
    Issue number5-8
    DOIs
    Publication statusPublished - 2007
    MoE publication typeA1 Journal article-refereed

    Fingerprint

    Nanoimprint lithography
    Polymers
    lithography
    Molecular weight
    Air
    molecular weight
    gratings
    air
    polymers

    Keywords

    • nanoimprint lithography
    • demolding
    • thermoplastic
    • molecular weight

    Cite this

    Merino, S. ; Schift, H. ; Retolaza, A. ; Haatainen, Tomi. / The use of automatic demolding in nanoimprint lithography processes. In: Microelectronic Engineering. 2007 ; Vol. 84, No. 5-8. pp. 958-962.
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    The use of automatic demolding in nanoimprint lithography processes. / Merino, S.; Schift, H.; Retolaza, A.; Haatainen, Tomi.

    In: Microelectronic Engineering, Vol. 84, No. 5-8, 2007, p. 958-962.

    Research output: Contribution to journalArticleScientificpeer-review

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    AU - Schift, H.

    AU - Retolaza, A.

    AU - Haatainen, Tomi

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    KW - demolding

    KW - thermoplastic

    KW - molecular weight

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