The use of automatic demolding in nanoimprint lithography processes

S. Merino, H. Schift, A. Retolaza, Tomi Haatainen

Research output: Contribution to journalArticleScientificpeer-review

21 Citations (Scopus)

Abstract

Three different setups for automatic demolding in nanoimprint, including air induced demolding and fast and slow demolding, are studied for different stamps designs, and compared with standard manual demolding.
A comparison between the setups shows differences in quality between polymers of different molecular weight, and of different grating periods.
Original languageEnglish
Pages (from-to)958-962
JournalMicroelectronic Engineering
Volume84
Issue number5-8
DOIs
Publication statusPublished - 2007
MoE publication typeA1 Journal article-refereed

Fingerprint

Nanoimprint lithography
Polymers
lithography
Molecular weight
Air
molecular weight
gratings
air
polymers

Keywords

  • nanoimprint lithography
  • demolding
  • thermoplastic
  • molecular weight

Cite this

Merino, S. ; Schift, H. ; Retolaza, A. ; Haatainen, Tomi. / The use of automatic demolding in nanoimprint lithography processes. In: Microelectronic Engineering. 2007 ; Vol. 84, No. 5-8. pp. 958-962.
@article{e668781b054e4bb79c2e71c780a1b8dc,
title = "The use of automatic demolding in nanoimprint lithography processes",
abstract = "Three different setups for automatic demolding in nanoimprint, including air induced demolding and fast and slow demolding, are studied for different stamps designs, and compared with standard manual demolding. A comparison between the setups shows differences in quality between polymers of different molecular weight, and of different grating periods.",
keywords = "nanoimprint lithography, demolding, thermoplastic, molecular weight",
author = "S. Merino and H. Schift and A. Retolaza and Tomi Haatainen",
year = "2007",
doi = "10.1016/j.mee.2007.01.023",
language = "English",
volume = "84",
pages = "958--962",
journal = "Microelectronic Engineering",
issn = "0167-9317",
publisher = "Elsevier",
number = "5-8",

}

The use of automatic demolding in nanoimprint lithography processes. / Merino, S.; Schift, H.; Retolaza, A.; Haatainen, Tomi.

In: Microelectronic Engineering, Vol. 84, No. 5-8, 2007, p. 958-962.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - The use of automatic demolding in nanoimprint lithography processes

AU - Merino, S.

AU - Schift, H.

AU - Retolaza, A.

AU - Haatainen, Tomi

PY - 2007

Y1 - 2007

N2 - Three different setups for automatic demolding in nanoimprint, including air induced demolding and fast and slow demolding, are studied for different stamps designs, and compared with standard manual demolding. A comparison between the setups shows differences in quality between polymers of different molecular weight, and of different grating periods.

AB - Three different setups for automatic demolding in nanoimprint, including air induced demolding and fast and slow demolding, are studied for different stamps designs, and compared with standard manual demolding. A comparison between the setups shows differences in quality between polymers of different molecular weight, and of different grating periods.

KW - nanoimprint lithography

KW - demolding

KW - thermoplastic

KW - molecular weight

U2 - 10.1016/j.mee.2007.01.023

DO - 10.1016/j.mee.2007.01.023

M3 - Article

VL - 84

SP - 958

EP - 962

JO - Microelectronic Engineering

JF - Microelectronic Engineering

SN - 0167-9317

IS - 5-8

ER -