Three different setups for automatic demolding in nanoimprint, including air induced demolding and fast and slow demolding, are studied for different stamps designs, and compared with standard manual demolding. A comparison between the setups shows differences in quality between polymers of different molecular weight, and of different grating periods.
|Publication status||Published - 2006|
|MoE publication type||A4 Article in a conference publication|
|Event||32nd International Conference on Micro- and Nano- Engineering, MNE 2006 - Barcelona, Spain|
Duration: 17 Sep 2006 → 20 Sep 2006
Merino, S., Schift, H., Retolaza, A., & Haatainen, T. (2006). The use of automatic demolding in nanoimprint lithography processes. Microelectronic Engineering, 84(5-8), 958-962. https://doi.org/10.1016/j.mee.2007.01.023