The use of automatic demolding in nanoimprint lithography processes

Santos Merino, Helmut Schift, Artiz Retolaza, Tomi Haatainen

    Research output: Contribution to journalArticle in a proceedings journalScientificpeer-review

    21 Citations (Scopus)

    Abstract

    Three different setups for automatic demolding in nanoimprint, including air induced demolding and fast and slow demolding, are studied for different stamps designs, and compared with standard manual demolding. A comparison between the setups shows differences in quality between polymers of different molecular weight, and of different grating periods.
    Original languageEnglish
    Pages (from-to)958-962
    JournalMicroelectronic Engineering
    Volume84
    Issue number5-8
    DOIs
    Publication statusPublished - 2006
    MoE publication typeA4 Article in a conference publication
    Event32nd International Conference on Micro- and Nano- Engineering, MNE 2006 - Barcelona, Spain
    Duration: 17 Sep 200620 Sep 2006

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