The use of automatic demolding in nanoimprint lithography processes

Santos Merino; Helmut Schift; Artiz Retolaza; Tomi Haatainen

doi:10.1016/j.mee.2007.01.023

The use of automatic demolding in nanoimprint lithography processes

Santos Merino
, Helmut Schift
, Artiz Retolaza
, Tomi Haatainen

Fundación Tekniker
Paul Scherrer Institute (PSI)

Research output: Contribution to journal › Article in a proceedings journal › Scientific › peer-review

22 Citations (Scopus)

Abstract

Three different setups for automatic demolding in nanoimprint, including air induced demolding and fast and slow demolding, are studied for different stamps designs, and compared with standard manual demolding. A comparison between the setups shows differences in quality between polymers of different molecular weight, and of different grating periods.

Original language	English
Pages (from-to)	958-962
Journal	Microelectronic Engineering
Volume	84
Issue number	5-8
DOIs	https://doi.org/10.1016/j.mee.2007.01.023
Publication status	Published - 2006
MoE publication type	A4 Article in a conference publication
Event	32nd International Conference on Micro- and Nano- Engineering, MNE 2006 - Barcelona, Spain Duration: 17 Sept 2006 → 20 Sept 2006

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10.1016/j.mee.2007.01.023

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title = "The use of automatic demolding in nanoimprint lithography processes",

abstract = "Three different setups for automatic demolding in nanoimprint, including air induced demolding and fast and slow demolding, are studied for different stamps designs, and compared with standard manual demolding. A comparison between the setups shows differences in quality between polymers of different molecular weight, and of different grating periods.",

author = "Santos Merino and Helmut Schift and Artiz Retolaza and Tomi Haatainen",

year = "2006",

doi = "10.1016/j.mee.2007.01.023",

language = "English",

volume = "84",

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journal = "Microelectronic Engineering",

issn = "0167-9317",

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note = "32nd International Conference on Micro- and Nano- Engineering, MNE 2006 ; Conference date: 17-09-2006 Through 20-09-2006",

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T1 - The use of automatic demolding in nanoimprint lithography processes

AU - Merino, Santos

AU - Schift, Helmut

AU - Retolaza, Artiz

AU - Haatainen, Tomi

PY - 2006

Y1 - 2006

N2 - Three different setups for automatic demolding in nanoimprint, including air induced demolding and fast and slow demolding, are studied for different stamps designs, and compared with standard manual demolding. A comparison between the setups shows differences in quality between polymers of different molecular weight, and of different grating periods.

AB - Three different setups for automatic demolding in nanoimprint, including air induced demolding and fast and slow demolding, are studied for different stamps designs, and compared with standard manual demolding. A comparison between the setups shows differences in quality between polymers of different molecular weight, and of different grating periods.

U2 - 10.1016/j.mee.2007.01.023

DO - 10.1016/j.mee.2007.01.023

M3 - Article in a proceedings journal

SN - 0167-9317

VL - 84

SP - 958

EP - 962

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 5-8

T2 - 32nd International Conference on Micro- and Nano- Engineering, MNE 2006

Y2 - 17 September 2006 through 20 September 2006

ER -

The use of automatic demolding in nanoimprint lithography processes

Abstract

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